SCHEMBL18176977

SCHEMBL18176977

CCC(C)(C)C(=O)OC1(C(C)(CC)CC)CCCCC1

nearest known ligand 0.38

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ADORA3 P0DMS8 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18176999 0.98 ADORA3 (0.31) ADORA3
SCHEMBL6367123 0.88 ADORA3 (0.33) ADORA3
SCHEMBL18269894 0.88 ADORA3 (0.33) ADORA3
SCHEMBL18068643 0.88 ADORA3 (0.33) ADORA3
SCHEMBL18176987 0.86 ADORA3 (0.33) ADORA3
SCHEMBL17789336 0.86 ADORA3 (0.33) ADORA3
SCHEMBL18176981 0.86 ADORA3 (0.33) ADORA3
SCHEMBL6367125 0.86 ADORA3 (0.31) ADORA3
SCHEMBL6367495 0.86 ADORA3 (0.31) ADORA3
SCHEMBL18198995 0.85 ADORA3 (0.32) ADORA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9952509-B2 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, method for manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2018-04-24 US disclosed
US-20180081271-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2018-03-22 US disclosed
US-20160313645-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2016-10-27 US disclosed