⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL181570 | 0.79 | — | — | |
| SCHEMBL5955190 | 0.79 | QPCT (0.54) | — | |
| SCHEMBL29226918 | 0.78 | GAA (0.50) | — | |
| SCHEMBL11265724 | 0.77 | QPCT (0.52) | — | |
| SCHEMBL8589057 | 0.77 | — | — | |
| SCHEMBL28393366 | 0.75 | ALDH1A1 (0.53) | — | |
| SCHEMBL14324664 | 0.74 | GSK3A (0.50) | — | |
| SCHEMBL11022512 | 0.74 | TSHR (0.69) | — | |
| SCHEMBL1598194 | 0.74 | MAPT (0.50) | — | |
| Hydrochloric Acid SCHEMBL28391334 | 0.72 | QPCT (0.51) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 258 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5064747-A | Improved photosensitivity using an unsaturated 1,3-dithiol-2-ylidene derivative; lithographic printing plates; photoresists | FUJI PHOTO FILM CO., LTD. (JP) | 1991-11-12 | — | — | US | claimed |
| EP-0410654-A2 | Light- sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 1991-01-30 | — | — | EP | claimed |
| CN-118647612-A | Imidazolinone derivatives as inhibitors of protein kinases, in particular DYRK1A, CLK1 and/or CLK4 | 珀哈制药公司 | 2024-09-13 | — | — | CN | disclosed |
| WO-2024135443-A1 | PHOTOELECTRIC CONVERSION ELEMENT, IMAGING ELEMENT, OPTICAL SENSOR, AND COMPOUND | 富士フイルム株式会社 | 2024-06-27 | — | — | WO | disclosed |
| WO-2024122301-A1 | PHOTOELECTRIC CONVERSION ELEMENT, IMAGING DEVICE, PHOTOSENSOR, METHOD FOR PRODUCING IMAGING DEVICE, AND COMPOUND | 富士フイルム株式会社 | 2024-06-13 | — | — | WO | disclosed |
| WO-2024071143-A1 | PHOTOELECTRIC CONVERSION ELEMENT, IMAGING ELEMENT, LIGHT SENSOR, COMPOUND, AND COMPOUND PRODUCTION METHOD | 富士フイルム株式会社 | 2024-04-04 | — | — | WO | disclosed |
| WO-2024071188-A1 | PHOTOELECTRIC CONVERSION ELEMENT, IMAGING ELEMENT, LIGHT SENSOR, AND COMPOUND | 富士フイルム株式会社 | 2024-04-04 | — | — | WO | disclosed |
| EP-3823054-B1 | PHOTOELECTRIC CONVERSION ELEMENT, IMAGING ELEMENT, OPTICAL SENSOR, AND COMPOUND | FUJIFILM CORP (JP) | 2024-02-14 | — | — | EP | disclosed |
| EP-4306526-A2 | COMPOUND FOR PHOTOELECTRIC CONVERSION ELEMENT | FUJIFILM Corporation (JP) | 2024-01-17 | — | — | EP | disclosed |
| US-20230384496-A1 | OPTICAL MEMBER FOR USE IN DISPLAY DEVICE AND DISPLAY DEVICE INCLUDING DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2023-11-30 | — | — | US | disclosed |
| CN-114174396-B | Wavelength selective absorption filter and organic electroluminescent display device | 富士胶片株式会社 | 2023-10-10 | — | — | CN | disclosed |
| US-4025349-A | Silver halide photographic elements spectrally sensitized with an acetylenic analog of cyanine or merocyanine dyes | EASTMAN KODAK COMPANY (US) | 1977-05-24 | — | — | US | disclosed |
| US-RE29168-E | HEAT SENSITIVE, ANTIHALATION LAYER | EASTMAN KODAK COMPANY (US) | 1977-04-05 | — | — | US | disclosed |
| US-4007170-A | SILVER HALIDE SENSITIZERS | EASTMAN KODAK COMPANY (US) | 1977-02-08 | — | — | US | disclosed |
| US-4002480-A | CONTAINING A DINUCLEAR MEROCYANINE SENSITIZING DYE AND AN ANTIFOGGING AGENT | FUJI PHOTO FILM CO., LTD. (JA) | 1977-01-11 | — | — | US | disclosed |
| US-3976661-A | SENSITIZERS, FILTERS | EASTMAN KODAK COMPANY (US) | 1976-08-24 | — | — | US | disclosed |
| US-3943142-A | Dye intermediates and their preparation and use in the synthesis of methine dyes | EASTMAN KODAK COMPANY (US) | 1976-03-09 | — | — | US | disclosed |
| US-3936308-A | Photographic emulsions containing methine dyes having a 1H-imidazo[4,5-b]pyrazine nucleus | EASTMAN KODAK COMPANY (US) | 1976-02-03 | — | — | US | disclosed |
| US-3935010-A | IMIDAZOQUINOXALINE DESENSITIZER | EASTMAN KODAK COMPANY (US) | 1976-01-27 | — | — | US | disclosed |
| US-3932182-A | An organic photoconductive composition comprising an organic photoconductive compound and a sensitizing compound having an active methylene group | MITSUBISHI PAPER MILLS, LTD. (JA) | 1976-01-13 | — | — | US | disclosed |