⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18199024 | 0.97 | — | — | |
| SCHEMBL18198993 | 0.90 | — | — | |
| SCHEMBL18198994 | 0.90 | — | — | |
| SCHEMBL18199000 | 0.87 | — | — | |
| SCHEMBL14769063 | 0.87 | CTSK (0.30) | — | |
| SCHEMBL15836523 | 0.79 | TSHR (0.33) | — | |
| SCHEMBL15836522 | 0.76 | TSHR (0.34) | — | |
| SCHEMBL16746667 | 0.75 | CTSK (0.37) | — | |
| SCHEMBL106870 | 0.75 | CTSK (0.37) | — | |
| SCHEMBL18198997 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230194986-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-22 | — | — | US | disclosed |
| US-20160320699-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-11-03 | — | — | US | disclosed |