SCHEMBL18199039

SCHEMBL18199039

CCC(C)(C)C(=O)OC1(C(F)(F)F)CCCC1

nearest known ligand 0.34

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ADORA3 P0DMS8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18198995 0.98 ADORA3 (0.32) ADORA3
SCHEMBL17552834 0.88
SCHEMBL16592056 0.87
SCHEMBL6367495 0.86 ADORA3 (0.31) ADORA3
SCHEMBL6367125 0.86 ADORA3 (0.31) ADORA3
SCHEMBL25935295 0.85 ADORA3 (0.33) ADORA3
SCHEMBL13563629 0.85
SCHEMBL118816 0.85 MAPT (0.31)
SCHEMBL6367123 0.84 ADORA3 (0.33) ADORA3
SCHEMBL18068643 0.84 ADORA3 (0.33) ADORA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230194986-A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-06-22 US disclosed
US-20160320699-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-11-03 US disclosed