SCHEMBL1820307

SCHEMBL1820307

FC(F)C(F)C(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8723434 0.92
SCHEMBL10815068 0.92
SCHEMBL9650554 0.89 LMNA (0.33)
SCHEMBL10707092 0.89 LMNA (0.33)
SCHEMBL2483156 0.89
SCHEMBL29210273 0.89 LMNA (0.33)
SCHEMBL2353784 0.89
SCHEMBL235006 0.81
SCHEMBL4726201 0.81
SCHEMBL5169523 0.81 LMNA (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1511833-B1 CLEANING COMPOSITIONS CONTAINING DICHLOROETHYLENE AND SIX CARBON ALKOXY SUBSTITUTED PERFLUORO COMPOUNDS KYZEN CORP (US) 2007-01-10 EP claimed
EP-1511833-A4 CLEANING COMPOSITIONS CONTAINING DICHLOROETHYLENE AND SIX CARBON ALKOXY SUBSTITUTED PERFLUORO COMPOUNDS KYZEN CORP (US) 2005-07-06 EP claimed
EP-1511833-A2 CLEANING COMPOSITIONS CONTAINING DICHLOROETHYLENE AND SIX CARBON ALKOXY SUBSTITUTED PERFLUORO COMPOUNDS Kyzen Corporation (US) 2005-03-09 EP claimed
US-6699829-B2 ALSO CONTAINING ADDITIVE SELECTED FROM HIGHLY FLUORINATED COMPOUND AND ENHANCEMENT AGENT OR MIXTURES KYZEN CORPORATION 2004-03-02 US claimed
WO-2003104365-A2 CLEANING COMPOSITIONS CONTAINING DICHLOROETHYLENE AND SIX CARBON ALKOXY SUBSTITUTED PERFLUORO COMPOUNDS KYZEN CORPORATION (US) 2003-12-18 WO claimed
US-20030228997-A1 CLEANING COMPOSITIONS CONTAINING DICHLOROETHYLENE AND SIX CARBON ALKOXY SUBSTITUTED PERFLUORO COMPOUNDS KYZEN CORPORATION 2003-12-11 US claimed
US-20030083220-A1 Low ozone depleting brominated compound mixtures for use in solvent and cleaning applications KYZEN CORPORATION 2003-05-01 US claimed
US-5811473-A ADHESION PROMOTER COMPRISING A POLYFLUOROALKANE COMPOUND, AN ALKANOL, A TRANSITION METAL COMPOUND AND AN AMINE COMPOUND LOCTITE CORPORATION (US) 1998-09-22 US claimed
JP-7166198-A None JP disclosed
US-11411223-B2 Negative electrode and lithium ion secondary battery TDK CORPORATION (JP) 2022-08-09 US disclosed
EP-2317543-A2 Gas for plasma reaction, process for producing the same and use Zeon Corporation (JP) 2011-05-04 EP disclosed
US-7652179-B2 Gas for plasma reaction, process for producing the same, and use thereof ZEON CORPORATION (JP) 2010-01-26 US disclosed
US-20080139855-A1 Gas for plasma reaction, process for producing the same, and use thereof ZEON CORPORATION (JP) 2008-06-12 US disclosed
US-7341764-B2 Chemical vapor deposition using compound such as perfluoro-2-pentyne gas for plasma reaction to form fluorocarbon thin film, semiconductors ZEON CORPORATION (JP) 2008-03-11 US disclosed
EP-0948033-A1 GAS COMPOSITION FOR DRY ETCHING AND PROCESS OF DRY ETCHING Japan as represented by Director-General, Agency of Industrial Science and Technology (JP) 1999-10-06 EP disclosed
US-5811473-A ADHESION PROMOTER COMPRISING A POLYFLUOROALKANE COMPOUND, AN ALKANOL, A TRANSITION METAL COMPOUND AND AN AMINE COMPOUND LOCTITE CORPORATION (US) 1998-09-22 US disclosed
EP-0701634-A1 MULTIPLE SOLVENT CLEANING SYSTEM AlliedSignal Inc. (US) 1996-03-20 EP disclosed
JP-H07166198-A SOLVENT COMPOSITION A G TECHNOL KK 1995-06-27 JP disclosed
WO-1994028196-A1 MULTIPLE SOLVENT CLEANING SYSTEM ALLIEDSIGNAL INC. (US) 1994-12-08 WO disclosed
US-5076956-A Mixtures of fluorocarbons with alcohols, ethers, esters, ketones, nitrogen-containing organic compounds, and halogenated hydrocarbons E. I. DU PONT DE NEMOURS AND COMPANY (US) 1991-12-31 US disclosed