SCHEMBL1820932

SCHEMBL1820932

CCCCCCCCCNC(N)=O

nearest known ligand 0.67

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 9/20 0.67
CASP2 P42575 1/20 0.59
ZDHHC20 Q5W0Z9 1/20 0.55
ZDHHC2 Q9UIJ5 1/20 0.55
NAAA Q02083 1/20 0.55
DPP7 Q9UHL4 1/20 0.52
RRM1 P23921 1/20 0.52
SPHK1 Q9NYA1 4/20 0.51

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL80555 1.00 EPHX1 (0.67) EPHX1CASP2ZDHHC20ZDHHC2NAAA
SCHEMBL3789783 1.00 EPHX1 (0.67) EPHX1CASP2ZDHHC20ZDHHC2NAAA
SCHEMBL292693 1.00 EPHX1 (0.67) EPHX1CASP2ZDHHC20ZDHHC2NAAA
SCHEMBL3055110 1.00 EPHX1 (0.67) EPHX1CASP2ZDHHC20ZDHHC2NAAA
SCHEMBL19468503 1.00 EPHX1 (0.67) EPHX1CASP2ZDHHC20ZDHHC2NAAA
SCHEMBL2185171 1.00 EPHX1 (0.67) EPHX1CASP2ZDHHC20ZDHHC2NAAA
SCHEMBL19468457 1.00 EPHX1 (0.67) EPHX1CASP2ZDHHC20ZDHHC2NAAA
SCHEMBL76613 1.00 EPHX1 (0.67) EPHX1CASP2ZDHHC20ZDHHC2NAAA
SCHEMBL944633 1.00 EPHX1 (0.67) EPHX1CASP2ZDHHC20ZDHHC2NAAA
SCHEMBL19468513 1.00 EPHX1 (0.67) EPHX1CASP2ZDHHC20ZDHHC2NAAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 114 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110171082-B Release agent for epoxy resin thermosetting body and preparation method thereof 扬州大学 2021-05-11 CN claimed
EP-2316877-A2 Materials free of endocrine disruptive activity Bittner, George (US) 2011-05-04 EP claimed
US-20100152313-A1 PROCESS FOR PREPARATION OF HIGH-MOLECULAR-WEIGHT POLYAMIDES BASF SE (DE) 2010-06-17 US claimed
CN-100537637-C Method for the production of high-molecular polyamides BASF AG (DE) 2009-09-09 CN claimed
US-20080312353-A1 Process for Preparation of High-Molecular-Weight Polyamides BASF AKTIENGESELLSCHAFT (DE) 2008-12-18 US claimed
EP-1776409-B1 METHOD FOR THE PRODUCTION OF HIGH-MOLECULAR POLYAMIDES BASF SE (DE) 2008-05-07 EP claimed
CN-1993402-A Method for the production of high-molecular polyamides BASF AG (DE) 2007-07-04 CN claimed
EP-3527600-B1 ISOCYANATE COMPOSITION AND PRODUCTION METHOD FOR ISOCYANATE POLYMER ASAHI CHEMICAL IND (JP) 2025-07-09 EP disclosed
EP-4446310-A1 METHOD FOR PRODUCING BLOCKED ISOCYANATE COMPOUND AND METHOD FOR PRODUCING ISOCYANATE COMPOUND Asahi Kasei Kabushiki Kaisha (JP) 2024-10-16 EP disclosed
CN-118382612-A Method for producing blocked isocyanate compound and method for producing isocyanate compound 旭化成株式会社 2024-07-23 CN disclosed
CN-118255685-A Tricyclic compound, pharmaceutical composition and application thereof 珂阑(上海)医药科技有限公司 2024-06-28 CN disclosed
WO-2024043261-A1 AZO COMPOUND OR SALT THEREOF, AND POLARIZING FILM, POLARIZING PLATE AND LIQUID CRYSTAL DISPLAY DEVICE COMPRISING SAME 日本化薬株式会社 2024-02-29 WO disclosed
CN-114026199-B Polarized light emitting film, polarized light emitting panel and display device containing water-soluble coumarin compound or salt thereof 日本化药株式会社 2023-12-26 CN disclosed
EP-0076634-A1 Process for preparation of metallic bottles TOYO SEIKAN KAISHA LIMITED (JP) 1983-04-13 EP disclosed
US-4217436-A N,N*-HYDROCARBYLENEDICARBONYLBIS/CYCLIC UREA/ THE UPJOHN COMPANY (US) 1980-08-12 US disclosed
US-4190599-A ACRYLATE COPOLYMER AND EPOXY RESIN THE UPJOHN COMPANY (US) 1980-02-26 US disclosed
US-4138398-A Bis-cyclic ureas THE UPJOHN COMPANY (US) 1979-02-06 US disclosed
US-3975463-A Molded structures containing crystalling polyolefin saponified ethylene vinyl acetate copolymer and carbonyl containing copolymers TOYO SEIKAN KAISHA LIMITED (JA) 1976-08-17 US disclosed
US-3932692-A Resinious laminates having improved gas permeation and delamination resistance TOYO SEIKAN KAISHA LIMITED (JA) 1976-01-13 US disclosed
US-3931449-A Resinous laminates having improved gas permeation and resistance to delamination TOYO SEIKAN KAISHA LIMITED (JA) 1976-01-06 US disclosed