SCHEMBL1821037

SCHEMBL1821037

FC(F)(F)/C(Cl)=C(\Cl)C(F)(F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1821038 1.00
SCHEMBL7984584 0.89
SCHEMBL668431 0.82
SCHEMBL20679246 0.82
SCHEMBL668432 0.82
SCHEMBL7882331 0.81 THRB (0.31)
SCHEMBL7186537 0.81 THRB (0.31)
SCHEMBL1219873 0.75
SCHEMBL1219874 0.75
SCHEMBL6239868 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2373600-B1 METHOD OF HYDRODECHLORINATION TO PRODUCE DIHYDROFLUORINATED OLEFINS DU PONT (US) 2013-04-24 EP disclosed
US-8399721-B2 Method of hydrodechlorination to produce dihydrofluorinated olefins E I DU PONT DE NEMOURS AND COMPANY (US) 2013-03-19 US disclosed
EP-2317543-A2 Gas for plasma reaction, process for producing the same and use Zeon Corporation (JP) 2011-05-04 EP disclosed
US-20100160696-A1 METHOD OF HYDRODECHLORINATION TO PRODUCE DIHYDROFLUORINATED OLEFINS E. I. DU PONT DE NEMOURS AND COMPANY (US) 2010-06-24 US disclosed
US-7652179-B2 Gas for plasma reaction, process for producing the same, and use thereof ZEON CORPORATION (JP) 2010-01-26 US disclosed
US-20080139855-A1 Gas for plasma reaction, process for producing the same, and use thereof ZEON CORPORATION (JP) 2008-06-12 US disclosed
US-7341764-B2 Chemical vapor deposition using compound such as perfluoro-2-pentyne gas for plasma reaction to form fluorocarbon thin film, semiconductors ZEON CORPORATION (JP) 2008-03-11 US disclosed
US-20050247670-A1 Method of dry etching, dry etching gas and process for producing perfluoro-2-pentyne ZEON CORPORATION (JP) 2005-11-10 US disclosed
CN-1669129-A Dry etching method, dry etching gas, and method for producing perfluoro-2-pentyne ZEON CORP (JP) 2005-09-14 CN disclosed
EP-1043297-B1 PROCESS FOR THE PREPARATION OF COMPOUNDS HAVING -CH2-CHF- GROUPS NIPPON ZEON CO (JP) 2005-06-29 EP disclosed
EP-1542268-A1 METHOD OF DRY ETCHING, DRY ETCHING GAS AND PROCESS FOR PRODUCING PERFLUORO-2-PENTYNE Zeon Corporation (JP) 2005-06-15 EP disclosed
US-20050092240-A1 Gas for plasma reaction, process for producing the same, and use ZEON CORPORATION (JP) 2005-05-05 US disclosed
EP-1453082-A1 GAS FOR PLASMA REACTION&amp;comma; PROCESS FOR PRODUCING THE SAME&amp;comma; AND USE Zeon Corporation (JP) 2004-09-01 EP disclosed
US-6395700-B1 CATALYTIC HYDROGENATION NIPPON ZEON CO., LTD. (JP) 2002-05-28 US disclosed
EP-0913380-B1 PROCESS FOR THE PREPARATION OF FLUORINATED OLEFIN AGENCY IND SCIENCE TECHN (JP) 2002-04-03 EP disclosed
US-6211420-B1 REACTING HALOGENATED OLEFIN WITH ALKALI METAL FLUORIDE IN PRESENCE OF SPECIFIED ORGANIC HALOGEN-CONTAINING COMPOUND TO PRODUCE FLUORINATED OLEFIN JAPAN AS REPRESENTED BY DIRECTOR GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2001-04-03 US disclosed
EP-1043297-A1 PROCESS FOR THE PREPARATION OF COMPOUNDS HAVING -CH2-CHF- GROUPS Nippon Zeon Co., Ltd. (JP) 2000-10-11 EP disclosed
EP-0913380-A1 PROCESS FOR THE PREPARATION OF FLUORINATED OLEFIN Japan as represented by Director-General, Agency of Industrial Science and Technology (JP) 1999-05-06 EP disclosed
EP-0714384-A1 PROCESS FOR COMBINING CHLORINE-CONTAINING MOLECULES TO SYNTHESIZE FLUORINE-CONTAINING PRODUCTS AlliedSignal Inc. (US) 1996-06-05 EP disclosed
WO-1995005353-A1 PROCESS FOR COMBINING CHLORINE-CONTAINING MOLECULES TO SYNTHESIZE FLUORINE-CONTAINING PRODUCTS ALLIEDSIGNAL INC. (US) 1995-02-23 WO disclosed