SCHEMBL18218329

SCHEMBL18218329

O=Cc1c(O)c(CO)c(CO)c(O)c1C=O

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ERBB2 P04626 1/20 0.41
PIM1 P11309 1/20 0.41
HKDC1 Q2TB90 1/20 0.41
MAOB P27338 1/20 0.39
KDM4E B2RXH2 1/20 0.39
MEN1 O00255 1/20 0.39
ALDH1A1 P00352 1/20 0.39
LMNA P02545 1/20 0.39
HPGD P15428 1/20 0.39
KMT2A Q03164 1/20 0.39
AOX1 Q06278 1/20 0.39
TRIM24 O15164 1/20 0.38
TRIM33 Q9UPN9 1/20 0.38
IGF1R P08069 1/20 0.36
SRC P12931 1/20 0.36
AXL P30530 1/20 0.36
PTK2 Q05397 1/20 0.36
AURKB Q96GD4 1/20 0.36
ALK Q9UM73 1/20 0.36
DRD4 P21917 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18218324 0.77 MAOB (0.53) MAOBKDM4EMEN1ALDH1A1LMNA
SCHEMBL1527081 0.72 IGF1R (0.65) PIM1MAOBKDM4EMEN1ALDH1A1
SCHEMBL1527114 0.72 MAOB (0.40) MAOBKDM4EMEN1ALDH1A1LMNA
SCHEMBL3090283 0.71 ERBB2 (0.48) ERBB2PIM1HKDC1KDM4EALDH1A1
SCHEMBL2692703 0.69 KDM4E (0.50) MAOBKDM4EMEN1ALDH1A1LMNA
SCHEMBL30938659 0.69 PADI4 (0.40) MAOBKDM4EMEN1ALDH1A1LMNA
SCHEMBL22087115 0.69
SCHEMBL16322537 0.68 PADI4 (0.43) MAOBKDM4EMEN1ALDH1A1LMNA
SCHEMBL15134153 0.68 ERBB2 (0.46) ERBB2PIM1HKDC1KDM4EALDH1A1
SCHEMBL3378739 0.66 ERN1 (0.44) KDM4EMEN1ALDH1A1LMNAHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11720024-B2 Resist underlayer film-forming composition containing indolocarbazole novolak resin NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2023-08-08 US disclosed
US-20160326396-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING NOVOLAC POLYMER HAVING SECONDARY AMINO GROUP NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-11-10 US disclosed