Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ERBB2 | P04626 | 1/20 | 0.46 |
| ▸ | PIM1 | P11309 | 1/20 | 0.46 |
| ▸ | HKDC1 | Q2TB90 | 1/20 | 0.46 |
| ▸ | DRD4 | P21917 | 1/20 | 0.45 |
| ▸ | PDXK | O00764 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3090283 | 0.96 | ERBB2 (0.48) | ERBB2PIM1HKDC1DRD4PDXK | |
| SCHEMBL1525964 | 0.82 | DRD4 (0.39) | ERBB2PIM1HKDC1DRD4 | |
| SCHEMBL16597206 | 0.79 | ERBB2 (0.39) | ERBB2PIM1HKDC1DRD4KDM4E | |
| SCHEMBL14446394 | 0.79 | LMNA (0.39) | ERBB2PIM1HKDC1DRD4 | |
| SCHEMBL9812437 | 0.74 | TSHR (0.47) | ERBB2PIM1HKDC1DRD4PDXK | |
| SCHEMBL12744505 | 0.74 | ERBB2 (0.40) | ERBB2PIM1HKDC1DRD4PDXK | |
| SCHEMBL16592889 | 0.73 | GABRA1 (0.39) | ERBB2PIM1HKDC1DRD4KDM4E | |
| SCHEMBL5516684 | 0.72 | KDM4E (0.38) | ERBB2PIM1HKDC1DRD4KDM4E | |
| SCHEMBL2798558 | 0.72 | KDM4E (0.38) | ERBB2PIM1HKDC1DRD4KDM4E | |
| SCHEMBL10130850 | 0.68 | CA2 (0.50) | ERBB2PIM1HKDC1DRD4KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9746772-B2 | Resist underlayer film forming composition for lithography containing polyether structure-containing resin | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-08-29 | — | — | US | disclosed |
| US-20160320704-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING POLYETHER STRUCTURE-CONTAINING RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2016-11-03 | — | — | US | disclosed |
| US-20130189533-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING POLYETHER STRUCTURE-CONTAINING RESIN | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2013-07-25 | — | — | US | disclosed |