SCHEMBL1822669

SCHEMBL1822669

CCOC(=O)C(=C(C1CCCCCCCCC1)C1CCCCCCCCC1)C1CCCCCCCCC1

nearest known ligand 0.47

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.47
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
MAPT P10636 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
THRB P10828 1/20 0.39
ATM Q13315 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
CHRM1 P11229 3/20 0.39
GAA P10253 1/20 0.38
HTT P42858 2/20 0.38
POLB P06746 1/20 0.38
HPGD P15428 1/20 0.38
NAAA Q02083 1/20 0.38
NPSR1 Q6W5P4 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5612207 0.90 ALDH1A1 (0.51) ALDH1A1MEN1KMT2AMAPTSMN1; SMN2
SCHEMBL10011600 0.90 ALDH1A1 (0.51) ALDH1A1MEN1KMT2AMAPTSMN1; SMN2
SCHEMBL5612199 0.90 ALDH1A1 (0.51) ALDH1A1MEN1KMT2AMAPTSMN1; SMN2
SCHEMBL10011604 0.90 ALDH1A1 (0.51) ALDH1A1MEN1KMT2AMAPTSMN1; SMN2
SCHEMBL5612718 0.88 ALDH1A1 (0.49) ALDH1A1MEN1KMT2AMAPTSMN1; SMN2
SCHEMBL5612714 0.88 ALDH1A1 (0.49) ALDH1A1MEN1KMT2AMAPTSMN1; SMN2
SCHEMBL29117777 0.85 ALDH1A1 (0.47) ALDH1A1MEN1KMT2AMAPTSMN1; SMN2
SCHEMBL10009279 0.84 ALDH1A1 (0.46) ALDH1A1MEN1KMT2AMAPTSMN1; SMN2
SCHEMBL27638613 0.84 ALDH1A1 (0.46) ALDH1A1MEN1KMT2AMAPTSMN1; SMN2
SCHEMBL10009275 0.84 ALDH1A1 (0.46) ALDH1A1MEN1KMT2AMAPTSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7834113-B2 Photoresist compositions and processes for preparing the same E. I. DU PONT DE NEMOURS AND COMPANY (US) 2010-11-16 US claimed
US-20060247400-A1 Photoresist compositions and processes for preparing the same U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2006-11-02 US claimed
WO-2015017295-A1 POLYMER PURIFICATION E. I. DU PONT DE NEMOURS AND COMPANY (US) 2015-02-05 WO disclosed
EP-2315739-B1 NEW PROPANOATES AND PROCESSES FOR PREPARING THE SAME DUPONT ELECTRONIC POLYMERS L P (US) 2014-11-12 EP disclosed
EP-1699850-B1 POLYMER PURIFICATION DUPONT ELECTRONIC POLYMERS L P (US) 2014-06-25 EP disclosed
EP-2315739-A1 NEW PROPANOATES AND PROCESSES FOR PREPARING THE SAME DuPont Electronic Polymers L.P. (US) 2011-05-04 EP disclosed
US-7834113-B2 Photoresist compositions and processes for preparing the same E. I. DU PONT DE NEMOURS AND COMPANY (US) 2010-11-16 US disclosed
EP-1509551-B1 PROCESS FOR PURIFICATION OF ALKOXYSTYRENE POLYMERS DUPONT ELECTRONIC POLYMERS L P (US) 2010-07-07 EP disclosed
WO-2010024841-A1 NEW PROPANOATES AND PROCESSES FOR PREPARING THE SAME DUPONT ELECTRONIC POLYMERS L.P. (US) 2010-03-04 WO disclosed
EP-1497341-B1 PREPARATION OF HOMO-, CO- AND TERPOLYMERS OF SUBSTITUTED STYRENES DUPONT ELECTRONIC POLYMERS L P (US) 2009-06-10 EP disclosed
EP-2049577-A2 METHODS FOR PREPARING POLYMERS FROM PHENOLIC MATERIALS AND COMPOSITIONS RELATING THERETO Dupont Electronic Polymers L.P. (US) 2009-04-22 EP disclosed
WO-2006091375-A1 ANHYDROUS, LIQUID PHASE PROCESS FOR PREPARING HYDROXYL CONTAINING POLYMERS OF ENHANCED PURITY DUPONT ELECTRONIC POLYMERS L.P. (US) 2006-08-31 WO disclosed
WO-2005061590-A1 POLYMER PURIFICATION DUPONT ELECTRONIC POLYMERS L.P. (US) 2005-07-07 WO disclosed
EP-1509551-A1 PROCESS FOR PURIFICATION OF ALKOXYSTYRENE POLYMERS Dupont Electronic Technologies L.P. (US) 2005-03-02 EP disclosed
EP-1497341-A1 PREPARATION OF HOMO-, CO- AND TERPOLYMERS OF SUBSTITUTED STYRENES Dupont Electronic Technologies L.P. (US) 2005-01-19 EP disclosed
EP-1497339-A1 ANHYDROUS, LIQUID PHASE PROCESS FOR PREPARING HYDROXYL CONTAINING POLYMERS OF ENHANCED PURITY Dupont Electronic Technologies L.P. (US) 2005-01-19 EP disclosed
EP-1479700-A1 Processes for preparing photoresist compositions E.I. DUPONT DE NEMOURS AND COMPANY (US) 2004-11-24 EP disclosed
WO-2003089482-A1 PREPARATION OF HOMO-, CO- AND TERPOLYMERS OF SUBSTITUTED STYRENES DUPONT ELECTRONIC TECHNOLOGIES L.P. (US) 2003-10-30 WO disclosed
WO-2003089480-A1 ANHYDROUS, LIQUID PHASE PROCESS FOR PREPARING HYDROXYL CONTAINING POLYMERS OF ENHANCED PURITY DUPONT ELECTRONIC TECHNOLOGIES L.P. (US) 2003-10-30 WO disclosed
WO-2003089481-A1 PROCESS FPR PURIFICATION OF ALKOXYSTYRENE POLYMERS DUPONT ELECTRONIC TECHNOLOGIES L.P. (US) 2003-10-30 WO disclosed