⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18242270 | 0.90 | — | — | |
| SCHEMBL18242821 | 0.87 | — | — | |
| SCHEMBL18243854 | 0.87 | — | — | |
| SCHEMBL18243818 | 0.87 | — | — | |
| SCHEMBL18243479 | 0.77 | — | — | |
| SCHEMBL18242604 | 0.71 | — | — | |
| SCHEMBL392318 | 0.67 | — | — | |
| SCHEMBL66537 | 0.66 | ALDH1A1 (0.39) | — | |
| SCHEMBL18242148 | 0.62 | — | — | |
| SCHEMBL7632472 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10451967-B2 | Acid- and radical-generating agent and method for generating acid and radical | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-10-22 | — | — | US | disclosed |
| US-10367231-B2 | Magnesium-containing electrolytic solution | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-07-30 | — | — | US | disclosed |
| EP-3226340-B1 | MAGNESIUM-CONTAINING ELECTROLYTIC SOLUTION | FUJIFILM WAKO PURE CHEMICAL CORP (JP) | 2018-11-07 | — | — | EP | disclosed |
| US-20170331154-A1 | MAGNESIUM-CONTAINING ELECTROLYTIC SOLUTION | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2017-11-16 | — | — | US | disclosed |
| EP-3226340-A1 | MAGNESIUM-CONTAINING ELECTROLYTIC SOLUTION | Wako Pure Chemical Industries, Ltd. (JP) | 2017-10-04 | — | — | EP | disclosed |
| US-20160342084-A1 | ACID- AND RADICAL-GENERATING AGENT AND METHOD FOR GENERATING ACID AND RADICAL | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2016-11-24 | — | — | US | disclosed |