⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5087259 | 0.85 | — | — | |
| SCHEMBL11421488 | 0.78 | — | — | |
| SCHEMBL9323168 | 0.78 | — | — | |
| SCHEMBL18245458 | 0.75 | TSHR (0.35) | — | |
| SCHEMBL186479 | 0.71 | — | — | |
| SCHEMBL1252498 | 0.71 | — | — | |
| SCHEMBL276850 | 0.71 | — | — | |
| SCHEMBL9352501 | 0.71 | — | — | |
| SCHEMBL19036801 | 0.67 | — | — | |
| SCHEMBL941538 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3327002-B1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORP (JP) | 2020-08-19 | — | — | EP | disclosed |
| US-10428015-B2 | Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-10-01 | — | — | US | disclosed |
| US-20190002403-A1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-01-03 | — | — | US | disclosed |
| EP-3098226-B1 | BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORP (JP) | 2018-12-12 | — | — | EP | disclosed |
| US-10100070-B2 | Borate-based base generator, and base-reactive composition comprising such base generator | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2018-10-16 | — | — | US | disclosed |
| EP-3327002-A1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | Wako Pure Chemical Industries, Ltd. (JP) | 2018-05-30 | — | — | EP | disclosed |
| EP-3098226-A1 | BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR | Wako Pure Chemical Industries, Ltd. (JP) | 2016-11-30 | — | — | EP | disclosed |
| US-20160340374-A1 | BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2016-11-24 | — | — | US | disclosed |