SCHEMBL182468

SCHEMBL182468

C=[C]CCN(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30712969 0.70 CA12 (0.57)
SCHEMBL571157 0.69
SCHEMBL968052 0.69
SCHEMBL134548 0.67
SCHEMBL109552 0.67
SCHEMBL1577035 0.67
Water SCHEMBL11043956 0.67 ALDH1A1 (0.44)
SCHEMBL1453370 0.67
SCHEMBL196329 0.67
SCHEMBL966223 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9855531-B2 Polymer membrane for water treatment and method for manufacture of same, and water treatment method SEKISUI CHEMICAL CO., LTD. (JP) 2018-01-02 US disclosed
US-20160030892-A1 POLYMER MEMBRANE FOR WATER TREATMENT AND METHOD FOR MANUFACTURE OF SAME, AND WATER TREATMENT METHOD SEKISUI CHEMICAL CO LTD (JP) 2016-02-04 US disclosed
US-9159992-B2 Negative electrode active material for lithium ion secondary battery and lithium ion secondary battery ZEON CORPORATION (JP) 2015-10-13 US disclosed
EP-2548632-A1 MACROMOLECULAR WATER-TREATMENT MEMBRANE, MANUFACTURING METHOD THEREFOR, AND WATER TREATMENT METHOD Sekisui Chemical Co., Ltd. (JP) 2013-01-23 EP disclosed
US-20120325746-A1 POLYMER MEMBRANE FOR WATER TREATMENT AND METHOD FOR MANUFACTURE OF SAME, AND WATER TREATMENT METHOD SEKISUI CHEMICAL CO., LTD. (JP) 2012-12-27 US disclosed
EP-2403040-A1 NEGATIVE ELECTRODE ACTIVE MATERIAL FOR LITHIUM ION SECONDARY BATTERY, AND LITHIUM ION SECONDARY BATTERY Zeon Corporation (JP) 2012-01-04 EP disclosed
US-20100016147-A1 MATERIAL FOR FORMING ELECTROLESS PLATE, COATING SOLUTION FOR ADHERING CATALYST, METHOD FOR FORMING ELECTROLESS PLATE, AND PLATING METHOD KIMOTO Co, LTD. (JP) 2010-01-21 US disclosed
WO-2007037517-A1 CYCLIC OLEFIN RESIN FILM, POLARIZING PLATE, AND LIQUID CRYSTAL DISPLAY FUJIFILM CORPORATION (JP) 2007-04-05 WO disclosed
EP-1698645-A1 HYPERBRANCHED POLYMER, PROCESS FOR PRODUCING THE SAME AND RESIST COMPOSITION CONTAINING THE HYPERBRANCHED POLYMER Lion Corporation (JP) 2006-09-06 EP disclosed
EP-0382443-A2 A silver halide light-sensitive photographic material KONICA CORPORATION (JP) 1990-08-16 EP disclosed