⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12212755 | 0.87 | — | — | |
| SCHEMBL1628314 | 0.86 | — | — | |
| SCHEMBL15120004 | 0.84 | — | — | |
| SCHEMBL13325995 | 0.84 | — | — | |
| SCHEMBL18845420 | 0.80 | — | — | |
| SCHEMBL15721248 | 0.79 | — | — | |
| SCHEMBL12677510 | 0.79 | HMGCR (0.31) | — | |
| SCHEMBL17409239 | 0.76 | HMGCR (0.30) | — | |
| SCHEMBL12905152 | 0.76 | HMGCR (0.31) | — | |
| SCHEMBL19750796 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170131635-A1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-05-11 | — | — | US | disclosed |
| US-20160342086-A1 | POLYMER, MONOMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-11-24 | — | — | US | disclosed |