SCHEMBL18260682

SCHEMBL18260682

C=CC(=O)OC(F)C(F)(F)C(F)C(F)C(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2158899 0.95
SCHEMBL28477271 0.93
SCHEMBL63734 0.89 TSHR (0.31)
SCHEMBL28516394 0.87
SCHEMBL2784240 0.84
Acrylic Acid SCHEMBL1327373 0.84 LMNA (0.34)
Propene SCHEMBL28314959 0.84 TSHR (0.32)
SCHEMBL18260690 0.81
SCHEMBL1322754 0.81
SCHEMBL41966 0.81 TSHR (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118693332-A Solid electrolyte, preparation method and application thereof 江苏蓝固新能源科技有限公司 2024-09-24 CN claimed
CN-116404159-A Adhesive, and preparation method and application thereof 上海华谊三爱富新材料有限公司 2023-07-07 CN claimed
CN-118693332-A Solid electrolyte, preparation method and application thereof 江苏蓝固新能源科技有限公司 2024-09-24 CN disclosed
CN-116404159-A Adhesive, and preparation method and application thereof 上海华谊三爱富新材料有限公司 2023-07-07 CN disclosed
US-11479627-B2 Film forming composition containing fluorine-containing surfactant NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2022-10-25 US disclosed
US-11459414-B2 Film forming composition containing fluorine-containing surfactant NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2022-10-04 US disclosed
US-20210280851-A1 Electrodes Including a Passivation Layer THE JOHNS HOPKINS UNIVERSITY 2021-09-09 US disclosed
US-20210102088-A1 FILM FORMING COMPOSITION CONTAINING FLUORINE-CONTAINING SURFACTANT NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2021-04-08 US disclosed
CN-105940348-B Composition for film formation containing fluorine-containing surfactant 日产化学工业株式会社 2019-12-06 CN disclosed
EP-3106921-A1 FILM-FORMING COMPOSITION INCLUDING FLUORINE-CONTAINING SURFACTANT Nissan Chemical Industries, Ltd. (JP) 2016-12-21 EP disclosed
US-20160347965-A1 FILM FORMING COMPOSITION CONTAINING FLUORINE-CONTAINING SURFACTANT NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-12-01 US disclosed