SCHEMBL1826316

SCHEMBL1826316

O=S(=O)(O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)F

nearest known ligand 0.38

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.38
KDM4E B2RXH2 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
CA2 P00918 3/20 0.34
CA1 P00915 2/20 0.34
MMP1 P03956 2/20 0.34
MMP2 P08253 2/20 0.34
MMP9 P14780 2/20 0.34
MMP8 P22894 2/20 0.34
MMP13 P45452 2/20 0.34
F2 P00734 1/20 0.31
PRSS1 P07477 1/20 0.31
PRSS2 P07478 1/20 0.31
PRSS3 P35030 1/20 0.31
USP2 O75604 1/20 0.31
MAPT P10636 1/20 0.31
ALDH1A1 P00352 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5492476 1.00 TSHR (0.38) TSHRKDM4ETDP1CA2CA1
SCHEMBL1827215 1.00 TSHR (0.38) TSHRKDM4ETDP1CA2CA1
SCHEMBL1576526 1.00 TSHR (0.38) TSHRKDM4ETDP1CA2CA1
SCHEMBL5484308 1.00 TSHR (0.38) TSHRKDM4ETDP1CA2CA1
SCHEMBL5485456 1.00 TSHR (0.38) TSHRKDM4ETDP1CA2CA1
SCHEMBL1824726 1.00 TSHR (0.38) TSHRKDM4ETDP1CA2CA1
SCHEMBL383637 1.00 TSHR (0.38) TSHRKDM4ETDP1CA2CA1
SCHEMBL1829776 1.00 TSHR (0.38) TSHRKDM4ETDP1CA2CA1
SCHEMBL1826686 1.00 TSHR (0.38) TSHRKDM4ETDP1CA2CA1
Ammonia Solution, Strong SCHEMBL18008412 0.98 TSHR (0.36) TSHRKDM4ETDP1CA2CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113252759-A Electrochemical gas sensor and electrolyte for electrochemical gas sensor 德尔格安全股份两合公司 2021-08-13 CN disclosed
US-20200326299-A1 ELECTROCHEMICAL GAS SENSOR AND ELECTROLYTE FOR AN ELECTROCHEMICAL GAS SENSOR Dräger Safety AG & Co. KGaA (DE) 2020-10-15 US disclosed
US-10732144-B2 Electrochemical gas sensor and electrolyte for an electrochemical gas sensor Dräger Safety AG & Co. KGaA (DE) 2020-08-04 US disclosed
EP-3367088-A1 ELECTROCHEMICAL GAS SENSOR AND ELECTROLYTE FOR AN ELECTROCHEMICAL GAS SENSOR Dräger Safety AG & Co. KGaA (DE) 2018-08-29 EP disclosed
EP-1686425-B1 METHOD FOR FORMING MULTILAYER RESIST DAIKIN IND LTD (JP) 2018-06-13 EP disclosed
US-20180031516-A1 ELECTROCHEMICAL GAS SENSOR AND ELECTROLYTE FOR AN ELECTROCHEMICAL GAS SENSOR Dräger Safety AG & Co. KGaA (DE) 2018-02-01 US disclosed
EP-3259583-A1 ELECTROCHEMICAL GAS SENSOR AND ELECTROLYTE FOR AN ELECTROCHEMICAL GAS SENSOR Dräger Safety AG & Co. KGaA (DE) 2017-12-27 EP disclosed
WO-2016131549-A1 ELECTROCHEMICAL GAS SENSOR AND ELECTROLYTE FOR AN ELECTROCHEMICAL GAS SENSOR Dräger Safety AG & Co. KGaA (DE) 2016-08-25 WO disclosed
EP-1818723-B1 COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN JSR CORP (JP) 2011-05-04 EP disclosed
US-7709182-B2 Composition for forming antireflection film, layered product, and method of forming resist pattern JSR CORPORATION (JP) 2010-05-04 US disclosed
US-20080124524-A1 Composition For Forming Antireflection Film, Layered Product, And Method Of Forming Resist Pattern JSR CORPORATION (JP) 2008-05-29 US disclosed
US-20070196763-A1 Method of forming laminated resist DAIKIN INDUSTRIES, LTD. 2007-08-23 US disclosed
EP-1818723-A1 COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN JSR Corporation (JP) 2007-08-15 EP disclosed
EP-1686425-A1 METHOD FOR FORMING MULTILAYER RESIST Daikin Industries, Ltd. (JP) 2006-08-02 EP disclosed