SCHEMBL1827439

SCHEMBL1827439

C=C(CC(=O)O)C(=O)NC(C)(C)CC(=O)O

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HMGCR P04035 1/20 0.38
CHRM1 P11229 1/20 0.38
TBXA2R P21731 1/20 0.38
ADRA1A P35348 1/20 0.38
CYP2C19 P33261 3/20 0.37
HIF1A Q16665 2/20 0.37
CYP2D6 P10635 1/20 0.37
TSHR P16473 1/20 0.37
ALOX15 P16050 1/20 0.36
HSD17B10 Q99714 1/20 0.36
TET2 Q6N021 1/20 0.35
KDM4E B2RXH2 1/20 0.33
FFAR1 O14842 1/20 0.33
CPT2 P23786 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
ALDH1A1 P00352 1/20 0.31
CYP3A4 P08684 1/20 0.31
CYP2C9 P11712 1/20 0.31
LDHA P00338 1/20 0.31
SRR Q9GZT4 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19986828 0.84 EPHX1 (0.37) TSHRALOX15HSD17B10TET2KDM4E
SCHEMBL472259 0.82 HMGCR (0.39) HMGCRCHRM1TBXA2RADRA1ACYP2C19
SCHEMBL1828957 0.80 HMGCR (0.38) HMGCRCHRM1TBXA2RADRA1ACYP2C19
SCHEMBL1825121 0.78 HMGCR (0.37) HMGCRCHRM1TBXA2RADRA1ACYP2C19
SCHEMBL1827967 0.77 CYP2C19 (0.47) CYP2C19HIF1AALDH1A1CYP3A4CYP2C9
SCHEMBL1826861 0.76 EGLN1 (0.37) HMGCRCHRM1TBXA2RADRA1ACYP2C19
SCHEMBL1826755 0.76 TSHR (0.35) HMGCRCHRM1TBXA2RADRA1ACYP2C19
SCHEMBL1826177 0.74 HSD17B10 (0.34) HMGCRCHRM1TBXA2RADRA1ACYP2C19
SCHEMBL17266437 0.73 CYP2C19 (0.46) HMGCRCHRM1TBXA2RADRA1ACYP2C19
SCHEMBL18125972 0.73 HMGCR (0.48) HMGCRCHRM1TBXA2RADRA1ACYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1818723-B1 COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN JSR CORP (JP) 2011-05-04 EP disclosed
US-7709182-B2 Composition for forming antireflection film, layered product, and method of forming resist pattern JSR CORPORATION (JP) 2010-05-04 US disclosed
US-20080124524-A1 Composition For Forming Antireflection Film, Layered Product, And Method Of Forming Resist Pattern JSR CORPORATION (JP) 2008-05-29 US disclosed
EP-1818723-A1 COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN JSR Corporation (JP) 2007-08-15 EP disclosed