Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | USP2 | O75604 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1824895 | 1.00 | TSHR (0.37) | TSHRKDM4ETDP1L3MBTL1HTT | |
| SCHEMBL5487198 | 1.00 | TSHR (0.37) | TSHRKDM4ETDP1L3MBTL1HTT | |
| SCHEMBL5489724 | 1.00 | TSHR (0.37) | TSHRKDM4ETDP1L3MBTL1HTT | |
| SCHEMBL1825529 | 1.00 | TSHR (0.37) | TSHRKDM4ETDP1L3MBTL1HTT | |
| SCHEMBL1593172 | 1.00 | TSHR (0.37) | TSHRKDM4ETDP1L3MBTL1HTT | |
| SCHEMBL1829369 | 1.00 | TSHR (0.37) | TSHRKDM4ETDP1L3MBTL1HTT | |
| SCHEMBL1827977 | 1.00 | TSHR (0.37) | TSHRKDM4ETDP1L3MBTL1HTT | |
| SCHEMBL5492820 | 1.00 | TSHR (0.37) | TSHRKDM4ETDP1L3MBTL1HTT | |
| SCHEMBL482289 | 0.97 | KDM4E (0.38) | TSHRKDM4ETDP1L3MBTL1HTT | |
| SCHEMBL482327 | 0.89 | KDM4E (0.39) | TSHRKDM4ETDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1686425-B1 | METHOD FOR FORMING MULTILAYER RESIST | DAIKIN IND LTD (JP) | 2018-06-13 | — | — | EP | disclosed |
| EP-1818723-B1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN | JSR CORP (JP) | 2011-05-04 | — | — | EP | disclosed |
| US-7709182-B2 | Composition for forming antireflection film, layered product, and method of forming resist pattern | JSR CORPORATION (JP) | 2010-05-04 | — | — | US | disclosed |
| US-20080124524-A1 | Composition For Forming Antireflection Film, Layered Product, And Method Of Forming Resist Pattern | JSR CORPORATION (JP) | 2008-05-29 | — | — | US | disclosed |
| US-20070196763-A1 | Method of forming laminated resist | DAIKIN INDUSTRIES, LTD. | 2007-08-23 | — | — | US | disclosed |
| EP-1818723-A1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN | JSR Corporation (JP) | 2007-08-15 | — | — | EP | disclosed |
| EP-1686425-A1 | METHOD FOR FORMING MULTILAYER RESIST | Daikin Industries, Ltd. (JP) | 2006-08-02 | — | — | EP | disclosed |
| US-6906167-B2 | Metathesis ring-opening polymerization using epoxides; using rare earth metal catalyst and reducing agent | KAO CORPORATION (JP) | 2005-06-14 | — | — | US | disclosed |
| US-20050004344-A1 | Process for producing polyether | KAO CORPORATION (JP) | 2005-01-06 | — | — | US | disclosed |
| US-6818148-B1 | CONTAINING NONIONIC PERFLUORO ENDCAPPED POLYETHER SURFACTANT; UNIFORM THICKNESS, DEFECT FREE, AQUEOUS ALKALINE DEVELOPER WETTABLE COATINGS; SOLUTION STORAGE STABILITY | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-11-16 | — | — | US | disclosed |
| US-6800723-B2 | EPOXY RESINS FORMED VIA CATALYTIC METHATHESIS RING-OPENING POLYMERIZATION WITH RARE EARTH METAL COMPLEX | KAO CORPORATION (JP) | 2004-10-05 | — | — | US | disclosed |
| EP-1057845-B1 | PROCESS FOR PRODUCING POLYETHER | KAO CORP (JP) | 2004-01-21 | — | — | EP | disclosed |
| US-20020151674-A1 | Epoxy resins formed via catalytic methathesis ring-opening polymerization with rare earth metal complex | KAO CORPORATION (JP) | 2002-10-17 | — | — | US | disclosed |
| US-6417323-B1 | RING-OPENING POLYMERIZATION OF SUBSTITUTED EPOXIDE IN RARE EARTH COMPOUND AND REDUCING AGENT PRESENCE; ETHERIFICATION | KAO CORPORATION (JP) | 2002-07-09 | — | — | US | disclosed |
| EP-1057845-A1 | PROCESS FOR PRODUCING POLYETHER | Kao Corporation (JP) | 2000-12-06 | — | — | EP | disclosed |
| EP-0381005-A2 | Ocular lens material | Menicon Co., Ltd. (JP) | 1990-08-08 | — | — | EP | disclosed |