Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1827977 | 0.97 | TSHR (0.37) | KDM4ETSHRTDP1L3MBTL1HTT | |
| SCHEMBL1825529 | 0.97 | TSHR (0.37) | KDM4ETSHRTDP1L3MBTL1HTT | |
| SCHEMBL1829369 | 0.97 | TSHR (0.37) | KDM4ETSHRTDP1L3MBTL1HTT | |
| SCHEMBL5489724 | 0.97 | TSHR (0.37) | KDM4ETSHRTDP1L3MBTL1HTT | |
| SCHEMBL1827807 | 0.97 | TSHR (0.37) | KDM4ETSHRTDP1L3MBTL1HTT | |
| SCHEMBL1593172 | 0.97 | TSHR (0.37) | KDM4ETSHRTDP1L3MBTL1HTT | |
| SCHEMBL5487198 | 0.97 | TSHR (0.37) | KDM4ETSHRTDP1L3MBTL1HTT | |
| SCHEMBL1824895 | 0.97 | TSHR (0.37) | KDM4ETSHRTDP1L3MBTL1HTT | |
| SCHEMBL5492820 | 0.97 | TSHR (0.37) | KDM4ETSHRTDP1L3MBTL1HTT | |
| SCHEMBL482327 | 0.92 | KDM4E (0.39) | KDM4ETSHRTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1285 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116601185-A | Olefin composition comprising hydrocarbon resin | 马特里亚公司 | 2023-08-15 | — | — | CN | claimed |
| CN-113355017-B | Low-refractive-index optical fiber coating resin with high glass transition temperature | 武汉长盈鑫科技有限公司 | 2022-04-29 | — | — | CN | claimed |
| CN-113355017-A | Low-refractive-index optical fiber coating resin with high glass transition temperature | 武汉长盈鑫科技有限公司 | 2021-09-07 | — | — | CN | claimed |
| EP-1710230-B1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-08-14 | — | — | EP | claimed |
| US-20130137037-A1 | Silicon Compound, Condensation Product, Resist Compostion and Pattern Formation Method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-05-30 | — | — | US | claimed |
| US-8435717-B2 | Compound for photoacid generator, resist composition using the same, and pattern-forming method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-05-07 | — | — | US | claimed |
| US-8283106-B2 | Sulfonic acid salt and derivative thereof, photoacid generator agent, and resist material and pattern formation method using the photoacid generator agent | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-10-09 | — | — | US | claimed |
| EP-1780199-B1 | Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2012-02-01 | — | — | EP | claimed |
| EP-1780198-B1 | Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2011-10-05 | — | — | EP | claimed |
| US-20100304303-A1 | Novel Sulfonic Acid Salt and Derivative Thereof, Photoacid Generator Agent, and Resist Material and Pattern Formation Method Using the Photoacid Generator Agent | CENTRAL GLASS COMPANY, LIMITED (JP) | 2010-12-02 | — | — | US | claimed |
| US-20080124656-A1 | NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST COMPOSITIONS, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-05-29 | — | — | US | claimed |
| US-20080085469-A1 | Novel photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-04-10 | — | — | US | claimed |
| US-20070298352-A1 | NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST COMPOSITIONS, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-27 | — | — | US | claimed |
| US-20070099113-A1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-03 | — | — | US | claimed |
| US-20070099112-A1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-03 | — | — | US | claimed |
| EP-1780199-A1 | Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2007-05-02 | — | — | EP | claimed |
| EP-1780198-A1 | Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2007-05-02 | — | — | EP | claimed |
| US-20060228648-A1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2006-10-12 | — | — | US | claimed |
| EP-1710230-A1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2006-10-11 | — | — | EP | claimed |
| US-6818148-B1 | CONTAINING NONIONIC PERFLUORO ENDCAPPED POLYETHER SURFACTANT; UNIFORM THICKNESS, DEFECT FREE, AQUEOUS ALKALINE DEVELOPER WETTABLE COATINGS; SOLUTION STORAGE STABILITY | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-11-16 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080124656-A1 | NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST COMPOSITIONS, AND PATTERNING PROCESS | HCN3, ASIC3, HCN4 | KDM4E 549/4885TSHR 1215/4885TDP1 4734/4885 |
| US-20070298352-A1 | NOVEL SULFONATE SALTS AND DERIVATIVES, PHOTOACID GENERATORS, RESIST COMPOSITIONS, AND PATTERNING PROCESS | HCN3, ASIC3, TST | KDM4E 409/4885TSHR 2374/4885TDP1 4617/4885 |
| US-20080085469-A1 | Novel photoacid generators, resist compositions, and patterning process | RER1, SCO2, ASIC3 | KDM4E 4073/4885TSHR 1699/4885TDP1 4679/4885 |
| US-20100304303-A1 | Novel Sulfonic Acid Salt and Derivative Thereof, Photoacid Generator Agent, and Resist Material and Pattern Formation Method Using the Photoacid Generator Agent | ARF1, ARF5, ARF6 | KDM4E 4759/4885TSHR 1570/4885TDP1 4255/4885 |
| US-20130137037-A1 | Silicon Compound, Condensation Product, Resist Compostion and Pattern Formation Method | CCNB1, FEM1B, SEM1 | KDM4E 3239/4885TSHR 4328/4885TDP1 2428/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.