SCHEMBL18287601

SCHEMBL18287601

C=C(CCl)C(=O)OC1(C)C2CC3CC(C2)CC1C3

nearest known ligand 0.39

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CYP17A1 P05093 2/20 0.39
CYP19A1 P11511 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10245200 0.89 CYP17A1 (0.40) CYP17A1CYP19A1
SCHEMBL10204726 0.85 CYP17A1 (0.40) CYP17A1CYP19A1
SCHEMBL1521172 0.84 CYP17A1 (0.39) CYP17A1CYP19A1
SCHEMBL711096 0.83 CYP17A1 (0.40) CYP17A1CYP19A1
SCHEMBL13113298 0.80 CYP17A1 (0.37) CYP17A1CYP19A1
SCHEMBL44331 0.80 CYP17A1 (0.40) CYP17A1CYP19A1
SCHEMBL8398065 0.80 CYP17A1 (0.40) CYP17A1CYP19A1
SCHEMBL210037 0.80 CYP19A1 (0.49) CYP17A1CYP19A1
SCHEMBL14523962 0.78 CYP17A1 (0.39) CYP17A1CYP19A1
SCHEMBL15279322 0.78 CYP17A1 (0.39) CYP17A1CYP19A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180088073-A1 GAS SENSOR AND METHOD OF MANUFACTURE THEREOF ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) 2018-03-29 US disclosed
US-20180031975-A1 PATTERN TREATMENT METHODS ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2018-02-01 US disclosed
US-9703203-B2 Compositions and methods for pattern treatment DOW GLOBAL TECHNOLOGIES LLC (US) 2017-07-11 US disclosed
US-9703203-B2 Compositions and methods for pattern treatment DOW GLOBAL TECHNOLOGIES LLC (US) 2017-07-11 US disclosed
US-9684241-B2 Compositions and methods for pattern treatment DOW GLOBAL TECHNOLOGIES LLC (US) 2017-06-20 US disclosed
US-9684241-B2 Compositions and methods for pattern treatment DOW GLOBAL TECHNOLOGIES LLC (US) 2017-06-20 US disclosed
US-9671697-B2 Pattern treatment methods DOW GLOBAL TECHNOLOGIES LLC (US) 2017-06-06 US disclosed
US-9671697-B2 Pattern treatment methods DOW GLOBAL TECHNOLOGIES LLC (US) 2017-06-06 US disclosed
US-9665005-B2 Pattern treatment methods DOW GLOBAL TECHNOLOGIES LLC (US) 2017-05-30 US disclosed
US-9665005-B2 Pattern treatment methods DOW GLOBAL TECHNOLOGIES LLC (US) 2017-05-30 US disclosed
US-20160357111-A1 COMPOSITIONS AND METHODS FOR PATTERN TREATMENT DOW GLOBAL TECHNOLOGIES LLC 2016-12-08 US disclosed
US-20160357111-A1 COMPOSITIONS AND METHODS FOR PATTERN TREATMENT DOW GLOBAL TECHNOLOGIES LLC 2016-12-08 US disclosed
US-20160357112-A1 COMPOSITIONS AND METHODS FOR PATTERN TREATMENT DOW GLOBAL TECHNOLOGIES LLC 2016-12-08 US disclosed
US-20160357109-A1 PATTERN TREATMENT METHODS DOW GLOBAL TECHNOLOGIES LLC 2016-12-08 US disclosed
US-20160357109-A1 PATTERN TREATMENT METHODS DOW GLOBAL TECHNOLOGIES LLC 2016-12-08 US disclosed
US-20160357110-A1 PATTERN TREATMENT METHODS ROHM AND HAAS ELECTRONIC MATERIALS LLC 2016-12-08 US disclosed
US-20160357112-A1 COMPOSITIONS AND METHODS FOR PATTERN TREATMENT DOW GLOBAL TECHNOLOGIES LLC 2016-12-08 US disclosed