Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP17A1 | P05093 | 2/20 | 0.40 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | ELANE | P08246 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27616990 | 0.93 | ALDH1A1 (0.48) | CYP17A1CYP19A1ALDH1A1 | |
| SCHEMBL21235008 | 0.92 | CYP17A1 (0.36) | CYP17A1CYP19A1ALDH1A1 | |
| SCHEMBL13900363 | 0.90 | ALDH1A1 (0.39) | CYP17A1CYP19A1ALDH1A1 | |
| Methacrylic Acid SCHEMBL6296789 | 0.89 | ALDH1A1 (0.44) | CYP17A1CYP19A1ALDH1A1 | |
| SCHEMBL3394712 | 0.88 | CYP17A1 (0.37) | CYP17A1CYP19A1ALDH1A1 | |
| Acrylic Acid SCHEMBL6297075 | 0.85 | ALDH1A1 (0.41) | CYP17A1CYP19A1ALDH1A1 | |
| SCHEMBL8398065 | 0.85 | CYP17A1 (0.40) | CYP17A1CYP19A1 | |
| SCHEMBL711096 | 0.85 | CYP17A1 (0.40) | CYP17A1CYP19A1 | |
| SCHEMBL13288279 | 0.85 | CYP17A1 (0.44) | CYP17A1CYP19A1 | |
| SCHEMBL17247236 | 0.85 | CYP17A1 (0.36) | CYP17A1CYP19A1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 4761 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120025480-A | Modified styrene-acrylic emulsion, interior wall coating and preparation method thereof | 立邦涂料（中国）有限公司 | 2025-05-23 | — | — | CN | claimed |
| CN-120005123-A | Acrylic ester block copolymer resin, photoresist, and preparation method and application thereof | 中国石油化工股份有限公司 | 2025-05-16 | — | — | CN | claimed |
| CN-119735762-A | Acrylic emulsion, application thereof and emulsion pressure-sensitive adhesive | 成都友一包装材料有限公司 | 2025-04-01 | — | — | CN | claimed |
| CN-119708332-A | Polymer for ArF photoresist, preparation method of polymer and photoresist composition | 中节能万润股份有限公司 | 2025-03-28 | — | — | CN | claimed |
| CN-119286334-B | Modified acrylic resin, preparation method thereof, transfer coating and transfer film | 广州慧谷新材料科技股份有限公司 | 2025-03-21 | — | — | CN | claimed |
| CN-119613607-A | Preparation method of 193nm photoresist resin | 江苏集萃光敏电子材料研究所有限公司 | 2025-03-14 | — | — | CN | claimed |
| CN-119285996-A | Temperature-solvent dual-response information processing hydrogel with host-guest recognition and regulation effects, preparation method and application thereof | 海南师范大学 | 2025-01-10 | — | — | CN | claimed |
| CN-119286334-A | Modified acrylic resin, preparation method thereof, transfer coating and transfer film | 广州慧谷新材料科技股份有限公司 | 2025-01-10 | — | — | CN | claimed |
| CN-119264321-A | Method for regulating and controlling molecular weight change of electronic grade acrylic resin | 厦门大学 | 2025-01-07 | — | — | CN | claimed |
| CN-119024644-A | Nanoimprint photoresist and preparation method thereof | 珠海莫界科技有限公司 | 2024-11-26 | — | — | CN | claimed |
| US-20020150834-A1 | Chemically amplified resist composition and method for forming patterned film using same | FUJITSU LIMITED (JP) | 2002-10-17 | — | — | US | claimed |
| US-20020081523-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL CO., LTD. | 2002-06-27 | — | — | US | claimed |
| US-6348297-B1 | COMPOSITION COMPRISING ACID GENERATOR COMPRISING ALIPHATIC SULFONIUM SALT, TRIPHENYLSULFONIUM OR DIPHENYLIODONIUM SALT,RESIN HAVING ACID-LABILE GROUP WHICH IS INSOLUBLE IN ALKALI BUT BECOMES SOLUBLE BY ACTION OF ACID | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-02-19 | — | — | US | claimed |
| US-20010044072-A1 | Photoresist compositions comprising blends of ionic and non-ionic photoacid generators | SHIPLEY COMPANY, L.L.C. (US) | 2001-11-22 | — | — | US | claimed |
| EP-1128213-A2 | Photoresist compositions comprising novel copolymers | Shipley Company LLC (US) | 2001-08-29 | — | — | EP | claimed |
| US-6280911-B1 | FORMING A PHOTORESIST RELIEF IMAGE ON MICROELECTRONIC WAFER SUBSTRATES OR FLAT PANEL DISPLAY SUBSTRATE, EXPOSURE TO ACTIVATING RADIATION | SHIPLEY COMPANY, L.L.C. | 2001-08-28 | — | — | US | claimed |
| EP-1091249-A1 | Copolymers having nitride and alicyclic leaving groups and photoresist compositions comprising same | Shipley Company LLC (US) | 2001-04-11 | — | — | EP | claimed |
| EP-1041442-A1 | Chemical amplification type positive resist | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-10-04 | — | — | EP | claimed |
| CN-1268680-A | Chemical enhancement type positive photoetching gum composition | SUMOTOMO CHEMICAL CO LTD (JP) | 2000-10-04 | — | — | CN | claimed |
| CN-1261171-A | Chemically enhanced possitive photoetching compositions | SUMITOMO CHEMICAL CO (JP) | 2000-07-26 | — | — | CN | claimed |