SCHEMBL18288152

SCHEMBL18288152

CC1CC(C(C)(C)O)CC(C(C)(C)O)C1

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17133474 0.97
SCHEMBL13414836 0.94 LMNA (0.32) LMNA
SCHEMBL14932170 0.88
SCHEMBL19829295 0.84
SCHEMBL26780708 0.79 LMNA (0.33) LMNA
SCHEMBL12453243 0.79 LMNA (0.33) LMNA
SCHEMBL14922891 0.78 LMNA (0.34) LMNA
SCHEMBL16216114 0.78 LMNA (0.34) LMNA
SCHEMBL14942465 0.78 LMNA (0.34) LMNA
SCHEMBL10005777 0.78 LMNA (0.34) LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9772555-B2 Methods of forming patterns using photoresists SAMSUNG ELECTRONICS CO., LTD. (KR) 2017-09-26 US disclosed
US-9772555-B2 Methods of forming patterns using photoresists SAMSUNG ELECTRONICS CO., LTD. (KR) 2017-09-26 US disclosed
US-20160358778-A1 METHODS OF FORMING PATTERNS USING PHOTORESISTS SAMSUNG ELECTRONICS CO., LTD. (KR) 2016-12-08 US disclosed
US-20160358778-A1 METHODS OF FORMING PATTERNS USING PHOTORESISTS SAMSUNG ELECTRONICS CO., LTD. (KR) 2016-12-08 US disclosed