Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 2/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.44 |
| ▸ | MAPT | P10636 | 2/20 | 0.44 |
| ▸ | HCRTR1 | O43613 | 1/20 | 0.44 |
| ▸ | GAA | P10253 | 1/20 | 0.44 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.37 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | PGR | P06401 | 10/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | CYP2B6 | P20813 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.34 |
| ▸ | MTOR | P42345 | 1/20 | 0.33 |
| ▸ | MAOB | P27338 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9052845 | 0.79 | POLB (0.35) | POLBALDH1A1KDM4EMAPTHCRTR1 | |
| SCHEMBL11681796 | 0.78 | POLB (0.47) | POLBALDH1A1KDM4EMAPTHCRTR1 | |
| SCHEMBL25100645 | 0.74 | KDM4E (0.40) | POLBALDH1A1KDM4EMAPTHCRTR1 | |
| SCHEMBL19502639 | 0.74 | POLB (0.37) | POLBALDH1A1KDM4EMAPTHCRTR1 | |
| SCHEMBL27524563 | 0.74 | CSNK2A2 (0.37) | POLBALDH1A1KDM4EMAPTGAA | |
| SCHEMBL11757540 | 0.72 | LMNA (0.30) | — | |
| SCHEMBL28350084 | 0.72 | POLB (0.32) | POLB | |
| SCHEMBL11690765 | 0.69 | POLB (0.33) | POLB | |
| SCHEMBL15613906 | 0.69 | POLB (0.40) | POLBALDH1A1KDM4EMAPTHCRTR1 | |
| SCHEMBL19508742 | 0.69 | POLB (0.40) | POLBALDH1A1KDM4EMAPTHCRTR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122095316-A | Composition for forming resist underlayer film | — | 2026-05-26 | — | — | CN | disclosed |
| WO-2025095106-A1 | RESIST UNDERLAYER FILM FORMATION COMPOSITION | 日産化学株式会社 | 2025-05-08 | — | — | WO | disclosed |
| CN-114746468-B | Method for producing polymer | 日产化学株式会社 | 2024-09-13 | — | — | CN | disclosed |
| CN-117778244-A | High-efficiency degradation bacterium for long residual herbicide in corn field and application thereof | 河南省科学院生物研究所有限责任公司 | 2024-03-29 | — | — | CN | disclosed |
| US-20230103242-A1 | METHOD FOR PRODUCING POLYMER | NISSAN CHEMICAL CORPORATION (JP) | 2023-03-30 | — | — | US | disclosed |
| US-20230029997-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2023-02-02 | — | — | US | disclosed |
| CN-114761876-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2022-07-15 | — | — | CN | disclosed |
| CN-114746468-A | Method for producing polymer | 日产化学株式会社 | 2022-07-12 | — | — | CN | disclosed |
| WO-2021111977-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2021-06-10 | — | — | WO | disclosed |
| WO-2021111976-A1 | METHOD FOR PRODUCING POLYMER | 日産化学株式会社 | 2021-06-10 | — | — | WO | disclosed |
| US-20100022089-A1 | Method for manufacturing semiconductor device using quadruple-layer laminate | NISSIAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-01-28 | — | — | US | disclosed |
| US-7595144-B2 | Sulfonate-containing anti-reflective coating forming composition for lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-09-29 | — | — | US | disclosed |
| EP-2085823-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING QUADRUPLE-LAYER LAMINATE | Nissan Chemical Industries, Ltd. (JP) | 2009-08-05 | — | — | EP | disclosed |
| US-20080038678-A1 | Condensation Type Polymer-Containing Anti-Reflective Coating For Semiconductor | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 2008-02-14 | — | — | US | disclosed |
| US-20080003524-A1 | Sulfonate-Containing Anti-Reflective Coating Forming Composition for Lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-01-03 | — | — | US | disclosed |
| EP-1813987-A1 | SULFONIC-ESTER-CONTAINING COMPOSITION FOR FORMATION OF ANTIREFLECTION FILM FOR LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2007-08-01 | — | — | EP | disclosed |
| EP-1757986-A1 | ANTIREFLECTION FILM FOR SEMICONDUCTOR CONTAINING CONDENSATION TYPE POLYMER | Nissan Chemical Industries, Ltd. (JP) | 2007-02-28 | — | — | EP | disclosed |
| US-6759104-B2 | LIQUID CRYSTALS DISPLAY; MIXTURE CONTAINING ACRYLATED ESTERS; PHOTOPOLYMERIZATION USING FREE RADICAL CATALYSTS | MITSUBISHI CHEMICAL CORPORATION (JP) | 2004-07-06 | — | — | US | disclosed |
| US-20030118941-A1 | Photocurable composition, cured product and process for producing the same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2003-06-26 | — | — | US | disclosed |
| EP-1275668-A1 | PHOTOCURABLE COMPOSITION, CURED OBJECT, AND PROCESS FOR PRODUCING THE SAME | MITSUBISHI CHEMICAL CORPORATION (JP) | 2003-01-15 | — | — | EP | disclosed |