SCHEMBL1839645

SCHEMBL1839645

CCNOC(C)=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27988348 0.97
SCHEMBL27832438 0.97
Acetaldehyde SCHEMBL11594615 0.90 ALDH1A1 (0.35)
Hexane SCHEMBL5506444 0.88 ALDH1A1 (0.43)
Propanol SCHEMBL9691231 0.88 ALDH1A1 (0.33)
SCHEMBL27927880 0.79 MGAM (0.35)
SCHEMBL11363953 0.79 ALDH1A1 (0.44)
SCHEMBL20917228 0.79 ALDH1A1 (0.38)
SCHEMBL10763172 0.78
SCHEMBL5713423 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117230581-A Composite nanofiber membrane and preparation method and application thereof 湖南天为环保科技有限公司 2023-12-15 CN claimed
CN-114685471-A Preparation method of isoxazoline compound 沈阳科创化学品有限公司 2022-07-01 CN claimed
CN-113583217-A Waterborne epoxy curing agent, preparation method and application thereof, and waterborne epoxy resin modified emulsified asphalt 香港理工大学 2021-11-02 CN claimed
CN-102724967-A Polymeric conjugates of aromatic amine containing compounds including releasable urea linker ENZON PHARMACEUTICALS INC 2012-10-10 CN claimed
EP-0680078-B1 Semiconductor substrate surface treatment MITSUBISHI GAS CHEMICAL CO (JP) 2003-03-12 EP claimed
US-5972862-A COMPRISING A FLUORINE-CONTAINING COMPOUND, A WATER-SOLUBLE OR WATER-MISCIBLE ORGANIC SOLVENT, AN ORGANIC ACID, AND A QUATERNARY AMMONIUM SALT MITSUBISHI GAS CHEMICAL (JP) 1999-10-26 US claimed
US-5630904-A Stripping and cleaning agent for removing dry-etching and photoresist residues from a semiconductor substrate, and a method for forming a line pattern using the stripping and cleaning agent MITSUBISHI GAS CHEMICAL CO., INC. (JP) 1997-05-20 US claimed
EP-0680078-A2 Semiconductor substrate surface treatment MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1995-11-02 EP claimed
CN-1045792-A The manufacture method of esters PHARMACIA AB (SE) 1990-10-03 CN claimed
WO-2024241248-A1 COMPOUNDS TARGETING KRAS G12D MUTATIONS AND THEIR USES INNOPHARMASCREEN INC. (KR) 2024-11-28 WO disclosed
CN-113583217-B Water-based epoxy curing agent, preparation method and application thereof, and water-based epoxy resin modified emulsified asphalt 香港理工大学 2024-06-07 CN disclosed
CN-117230581-A Composite nanofiber membrane and preparation method and application thereof 湖南天为环保科技有限公司 2023-12-15 CN disclosed
CN-116472103-A Biodegradable controlled release microcapsules 恩盖普有限公司 2023-07-21 CN disclosed
US-20230142738-A1 ELECTROCHROMIC MATERIAL AND PREPARATION METHOD THEREOF, ELECTROCHROMIC DEVICE MICRON OPTOELECTRONICS CO., LTD. (CN) 2023-05-11 US disclosed
EP-0122788-A2 Self-leveling polish compositions and polymer compositions useful therein ROHM AND HAAS COMPANY (US) 1984-10-24 EP disclosed
EP-0120712-A2 Polish compositions and polish vehicles useful therein ROHM AND HAAS COMPANY (US) 1984-10-03 EP disclosed
US-4460734-A ETHYLENE OXIDE FATTY ALCOHOL ADDUCT, ADDITION POLYMER ROHM AND HAAS COMPANY (US) 1984-07-17 US disclosed
EP-0105382-A1 IMAGE-FORMING PHOTO-SENSITIVE MATERIAL SONY CORPORATION (JP) 1984-04-18 EP disclosed
US-4203859-A ACRYLIC POLYMER, METAL IONS, AMMONIA OR A VOLATILE AMINE ROHM AND HAAS COMPANY (US) 1980-05-20 US disclosed
US-4014883-A ANTITUMOR AGENTS HOFFMANN-LA ROCHE INC. (US) 1977-03-29 US disclosed