SCHEMBL184090

SCHEMBL184090

CC(C)CCC(C)(O)/C=C/C(C)(O)CCC(C)C

nearest known ligand 0.50

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
ALOX15 P16050 2/20 0.50
MEN1 O00255 1/20 0.50
CYP3A4 P08684 1/20 0.50
KMT2A Q03164 1/20 0.50
ALDH1A1 P00352 2/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
PTPN2 P17706 1/20 0.31
PTPN1 P18031 1/20 0.31
CDC25B P30305 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL184091 1.00 ALOX15 (0.50) ALOX15MEN1CYP3A4KMT2AALDH1A1
SCHEMBL28464135 0.89 ALOX15 (0.47) ALOX15MEN1CYP3A4KMT2A
SCHEMBL8532348 0.88 MEN1 (0.46) ALOX15MEN1CYP3A4KMT2A
SCHEMBL8153609 0.85 ALOX15 (0.68) ALOX15MEN1CYP3A4KMT2AL3MBTL1
SCHEMBL1783960 0.81 MEN1 (0.41) ALOX15MEN1CYP3A4KMT2AL3MBTL1
SCHEMBL1783962 0.81 MEN1 (0.41) ALOX15MEN1CYP3A4KMT2AL3MBTL1
SCHEMBL28961001 0.81 MEN1 (0.53) ALOX15MEN1CYP3A4KMT2APTPN2
SCHEMBL17451108 0.77 MEN1 (0.40) ALOX15MEN1CYP3A4KMT2AL3MBTL1
SCHEMBL29062382 0.75 MEN1 (0.40) ALOX15MEN1CYP3A4KMT2A
SCHEMBL17715626 0.75 MEN1 (0.40) ALOX15MEN1CYP3A4KMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 86 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118184892-A Graft copolymer composition, ABS resin, and preparation method and application thereof 金发科技股份有限公司 2024-06-14 CN claimed
CN-115109246-B Alkynyl alcohol ether and preparation method and application thereof 佳化化学科技发展(上海)有限公司 2023-07-14 CN claimed
CN-113316617-B Water-based ink for inkjet printing 花王株式会社 2023-06-06 CN claimed
CN-113150261-B Alkyne diol polyether surfactant, preparation method and application thereof 上海邦高化学有限公司 2023-05-05 CN claimed
CN-115976584-A Copper electroplating solution suitable for filling ultra-deep hole TSV and copper electroplating process thereof 深圳创智芯联科技股份有限公司 2023-04-18 CN claimed
CN-113713440-B Defoaming agent for shield and preparation and application thereof 中铁第五勘察设计院集团有限公司 2023-03-17 CN claimed
CN-111518603-B Water-based fully-synthetic sapphire glass cutting fluid and preparation method thereof 广东剑鑫科技股份有限公司 2023-02-10 CN claimed
CN-109762396-B Water-based ink and preparation method and application thereof 浙江华旭实业有限公司 2022-04-26 CN claimed
CN-113713440-A Defoaming agent for shield and preparation and application thereof 中铁第五勘察设计院集团有限公司 2021-11-30 CN claimed
CN-112708495-A GaAs wafer cutting liquid 江苏奥首材料科技有限公司 2021-04-27 CN claimed
CN-112708500-A Wafer cutting fluid 江苏奥首材料科技有限公司 2021-04-27 CN claimed
EP-2290023-B1 Inkjet aqueous ink TOSHIBA KK (JP) 2012-01-04 EP claimed
US-20110048278-A1 INKJET AQUEOUS INK KABUSHIKI KAISHA TOSHIBA (JP) 2011-03-03 US claimed
EP-2290023-A1 Inkjet aqueous ink Kabushiki Kaisha Toshiba (JP) 2011-03-02 EP claimed
CN-118302300-A Ink jet recording method 富士胶片株式会社 2024-07-05 CN disclosed
CN-118184892-A Graft copolymer composition, ABS resin, and preparation method and application thereof 金发科技股份有限公司 2024-06-14 CN disclosed
CN-118019814-A Inkjet ink and image recording method 富士胶片株式会社 2024-05-10 CN disclosed
US-20040242447-A1 Water-soluble surfactant composition NISSIN CHEMICAL INDUSTRY CO., LTD. (JP) 2004-12-02 US disclosed
US-6075060-A USEFUL IN LOWERING THE EQUILIBRIUM SURFACE TENSION OF AQUEOUS ORGANIC COMPOSITIONS, FOR EXAMPLE, THOSE USED IN COATINGS, INKS AND ADHESIVES AIR PRODUCTS AND CHEMICALS, INC. (US) 2000-06-13 US disclosed
EP-0940169-A1 Trans olefinic diols with surfactant properties AIR PRODUCTS AND CHEMICALS, INC. (US) 1999-09-08 EP disclosed