SCHEMBL18513404

SCHEMBL18513404

CC(C)OC(=O)CCSSCCC(=O)OC(C)(C)C

nearest known ligand 0.46

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
HDAC3 O15379 1/20 0.46
HDAC1 Q13547 1/20 0.46
HDAC2 Q92769 1/20 0.46
HDAC8 Q9BY41 1/20 0.46
HDAC6 Q9UBN7 1/20 0.46
LMNA P02545 3/20 0.42
CYP2D6 P10635 1/20 0.34
MAPT P10636 1/20 0.33
TSHR P16473 3/20 0.33
NOTUM Q6P988 1/20 0.32
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
CA7 P43166 1/20 0.31
HTT P42858 1/20 0.31
CTSK P43235 1/20 0.30
FOLH1 Q04609 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12560963 0.87 LMNA (0.48) HDAC3HDAC1HDAC2HDAC8HDAC6
SCHEMBL23895832 0.87 HDAC1 (0.51) HDAC3HDAC1HDAC2HDAC8HDAC6
SCHEMBL283645 0.87 LMNA (0.52) LMNACYP2D6MAPTTSHRNOTUM
SCHEMBL21580233 0.77 HDAC3 (0.42) HDAC3HDAC1HDAC2HDAC8HDAC6
SCHEMBL1584894 0.76 CYP2D6 (0.44) HDAC3HDAC1HDAC2HDAC8HDAC6
SCHEMBL26737546 0.75 HDAC2 (0.54) HDAC3HDAC1HDAC2HDAC8HDAC6
SCHEMBL8912333 0.75 CYP2D6 (0.46) HDAC3HDAC1HDAC2HDAC8HDAC6
SCHEMBL5016267 0.74 LMNA (0.52) LMNACYP2D6MAPTTSHRNOTUM
SCHEMBL5014070 0.74 HDAC1 (0.43) HDAC3HDAC1HDAC2HDAC8HDAC6
SCHEMBL20872178 0.74 HDAC3 (0.45) HDAC3HDAC1HDAC2HDAC8HDAC6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170045820-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING THE SAME NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-02-16 US disclosed