⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6537398 | 1.00 | — | — | |
| SCHEMBL465939 | 1.00 | — | — | |
| SCHEMBL14085305 | 0.80 | — | — | |
| SCHEMBL8373766 | 0.80 | — | — | |
| SCHEMBL23105063 | 0.80 | — | — | |
| SCHEMBL4612446 | 0.79 | — | — | |
| SCHEMBL4612448 | 0.79 | — | — | |
| SCHEMBL19622597 | 0.78 | ALDH1A1 (0.35) | — | |
| SCHEMBL11838843 | 0.78 | TSHR (0.33) | — | |
| SCHEMBL11418750 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 707 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240092954-A1 | POLYMER THIN FILM FOR CAPTURING AND RELEASING NUCLEIC ACID WITH HIGH EFFICIENCY AND METHOD FOR EXTRACTING NUCLEIC ACID USING THE SAME | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2024-03-21 | — | — | US | claimed |
| EP-1287047-B1 | PHOTO-POLYMERS AND USE THEREOF | TERAHERTZ PHOTONICS LTD (GB) | 2008-08-13 | — | — | EP | claimed |
| EP-4105271-B1 | POLYAMIDE COMPOSITIONS | ENVALIOR DEUTSCHLAND GMBH (DE) | 2026-05-20 | — | — | EP | disclosed |
| EP-4522686-B1 | CREEP-RESISTANT POLYESTER COMPOSITIONS | ENVALIOR DEUTSCHLAND GMBH (DE) | 2026-05-06 | — | — | EP | disclosed |
| EP-4314139-B1 | POLYAMIDE COMPOSITIONS | ENVALIOR DEUTSCHLAND GMBH (DE) | 2026-04-08 | — | — | EP | disclosed |
| EP-4314144-B1 | POLYAMIDE COMPOSITIONS | ENVALIOR DEUTSCHLAND GMBH (DE) | 2026-04-08 | — | — | EP | disclosed |
| EP-3868817-B1 | HIGH VOLUME COMPONENTS | ENVALIOR DEUTSCHLAND GMBH (DE) | 2026-03-25 | — | — | EP | disclosed |
| EP-4650444-A1 | NUCLEIC ACID EXTRACTION VESSEL PROVIDED WITH POSITIVELY CHARGED POLYMER THIN FILM, AND SINGLE-POT NUCLEIC ACID DETECTION METHOD USING CHARGE TRANSFER POLYPLEX | Korea Advanced Institute of Science and Technology (KR) | 2025-11-19 | — | — | EP | disclosed |
| EP-2924069-B2 | POLYAMIDE COMPOSITIONS | ENVALIOR DEUTSCHLAND GMBH (DE) | 2025-06-25 | — | — | EP | disclosed |
| EP-4345136-B1 | ELECTRONIC COMPONENT CONTAINING POLYCARBONATE MATERIAL WITH HIGH TRACK RESISTANCE | COVESTRO DEUTSCHLAND AG (DE) | 2025-06-11 | — | — | EP | disclosed |
| EP-4562076-A1 | MINERAL-FILLED POLYCARBONATE BLEND MOULDING COMPOSITION HAVING A LOW BPA CONTENT, AND METHOD FOR PREPARING SAME | Covestro Deutschland AG (DE) | 2025-06-04 | — | — | EP | disclosed |
| EP-0050262-A1 | Thermoplastic polyester moulding masses | BAYER AG (DE) | 1982-04-28 | — | — | EP | disclosed |
| EP-0042091-A1 | Vinyl chloride polymers having impact strength | BAYER AG (DE) | 1981-12-23 | — | — | EP | disclosed |
| US-4294905-A | DIAZO COMPOUNDS, OLEOPHILIC AND STORAGE STABLE | FUJI PHOTO FILM CO., LTD. (JP) | 1981-10-13 | — | — | US | disclosed |
| EP-0034748-A2 | Impact resistant polymers with particular resistance to atmospheric conditions | BAYER AG (DE) | 1981-09-02 | — | — | EP | disclosed |
| EP-0033081-A1 | Anionic copolymers containing polyvalent metal cations and their use in photographic materials | Agfa-Gevaert AG (DE) | 1981-08-05 | — | — | EP | disclosed |
| US-4065428-A | Polymethylmethacrylate based molding compositions | MONSANTO COMPANY (US) | 1977-12-27 | — | — | US | disclosed |
| US-4041017-A | Reactive light-sensitive high polymer compound containing furyl pentadienic ester groups and insolubilized by action of heat, light or electron beams | FUJI PHOTO FILM CO., LTD. (JA) | 1977-08-09 | — | — | US | disclosed |
| US-3933773-A | Thermoplastic elastomeric copolymers and terpolymers of tetrafluoroethylene and propylene and method of making the same | THIOKOL CORPORATION (US) | 1976-01-20 | — | — | US | disclosed |
| US-3931248-A | Reactive high polymer compound | FUJI PHOTO FILM CO., LTD. (JA) | 1976-01-06 | — | — | US | disclosed |