⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28849565 | 0.97 | LMNA (0.47) | — | |
| SCHEMBL5268 | 0.97 | — | — | |
| SCHEMBL20533540 | 0.93 | — | — | |
| SCHEMBL20533802 | 0.93 | — | — | |
| SCHEMBL2014530 | 0.93 | — | — | |
| Ethane SCHEMBL25228294 | 0.93 | — | — | |
| Butane SCHEMBL25220481 | 0.93 | LMNA (0.45) | — | |
| SCHEMBL20533675 | 0.93 | — | — | |
| SCHEMBL22581628 | 0.93 | — | — | |
| SCHEMBL20533646 | 0.93 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114059111-B | Method for forming silver coating | 丰田自动车株式会社 | 2023-11-10 | — | — | CN | disclosed |
| US-9206520-B2 | Inhibiting background plating | ROHM AND HAAS ELECTRONIC MATERIALS LLC | 2015-12-08 | — | — | US | disclosed |
| EP-2157209-B1 | Inhibiting Background Plating | ROHM & HAAS ELECT MAT (US) | 2014-10-22 | — | — | EP | disclosed |
| CN-103184483-A | Tin electroplating solution | ZHAO CHUNMEI | 2013-07-03 | — | — | CN | disclosed |
| CN-103184485-A | Tin electroplating solution | ZHAO CHUNMEI | 2013-07-03 | — | — | CN | disclosed |
| EP-2103716-B1 | Method for Inhibiting Background Plating | ROHM & HAAS ELECT MAT (US) | 2013-05-01 | — | — | EP | disclosed |
| CN-101667606-B | Inhibiting background plating | ROHM & HAAS ELECT MAT | 2013-02-13 | — | — | CN | disclosed |
| US-7939438-B2 | Method of inhibiting background plating | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-05-10 | — | — | US | disclosed |
| CN-101552306-B | Method for inhibiting background plating | ROHM & HAAS ELECT MAT | 2011-01-19 | — | — | CN | disclosed |
| CN-101667606-A | Inhibiting background plating | ROHM & HAAS ELECT MAT | 2010-03-10 | — | — | CN | disclosed |
| US-20090258491-A1 | Method of inhibiting background plating | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2009-10-15 | — | — | US | disclosed |
| CN-101552306-A | Method for inhibiting background plating | ROHM & HAAS ELECT MAT (US) | 2009-10-07 | — | — | CN | disclosed |
| EP-2103716-A1 | Method for Inhibiting Background Plating | Rohm and Haas Electronic Materials LLC (US) | 2009-09-23 | — | — | EP | disclosed |
| CN-100533785-C | Plating method | ROHM & HAAS ELECT MAT (US) | 2009-08-26 | — | — | CN | disclosed |
| US-20080035489-A1 | Plating process | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2008-02-14 | — | — | US | disclosed |
| CN-101123281-A | Plating method | ROHM & HAAS ELECT MAT (US) | 2008-02-13 | — | — | CN | disclosed |
| EP-1865563-A2 | Light assisted electro plating process | Rohm and Haas Electronic Materials, L.L.C. (US) | 2007-12-12 | — | — | EP | disclosed |
| US-4152162-A | PHOTOTHERMOGRAPHY, SILVER BEHENATE, SILVER SALT OF STRAIGHT CHAIN ALIPHATIC CARBOXYLIC ACID | FUJI PHOTO FILM CO., LTD. (JP) | 1979-05-01 | — | — | US | disclosed |
| US-4144072-A | CONTAINING A PHTHALAZINONE AND A PHTHALIMIDE | FUJI PHOTO FILM CO., LTD. (JP) | 1979-03-13 | — | — | US | disclosed |
| US-4125403-A | ORGANIC SILVER SALT, SILVER HALIDE, REDUCING AGENT, PHTHALAZINONE, AND A BENZOXAZINEDIONE OR QUINAZOLINEDIONE | FUJI PHOTO FILM CO., LTD. | 1978-11-14 | — | — | US | disclosed |