Phenolsulphonic Acid

Phenolsulphonic Acid

SCHEMBL1857993

O=S(=O)([O-])c1ccccc1O.[Ag+]

nearest known ligand 0.52

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

folP

The experimentally established mechanism targets of Phenolsulphonic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTGS1 P23219 1/20 0.52
PKLR P30613 4/20 0.48
DUSP5 Q16690 1/20 0.44
NR4A1 P22736 1/20 0.44
CDK2 P24941 1/20 0.42
PTPN1 P18031 2/20 0.42
PGAM1 P18669 2/20 0.42
CA2 P00918 3/20 0.41
CA4 P22748 3/20 0.41
POLB P06746 2/20 0.41
KDM4E B2RXH2 2/20 0.41
CA12 O43570 2/20 0.41
ALDH1A1 P00352 2/20 0.41
MAPT P10636 2/20 0.41
HPGD P15428 2/20 0.41
CA5A P35218 2/20 0.41
HSD17B10 Q99714 2/20 0.41
CA14 Q9ULX7 2/20 0.41
CA5B Q9Y2D0 2/20 0.41
TDP1 Q9NUW8 2/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Phenolsulphonic Acid SCHEMBL359607 0.95 PTGS1 (0.52) PTGS1PKLRDUSP5NR4A1CDK2
Phenolsulphonic Acid SCHEMBL237346 0.95 PTGS1 (0.52) PTGS1PKLRDUSP5NR4A1CDK2
Phenolsulphonic Acid SCHEMBL2967983 0.95 PTGS1 (0.52) PTGS1PKLRDUSP5NR4A1CDK2
Phenolsulphonic Acid SCHEMBL3176513 0.95 PTGS1 (0.52) PTGS1PKLRDUSP5NR4A1CDK2
Phenolsulphonic Acid SCHEMBL158699 0.95 PKLR (0.53) PTGS1PKLRDUSP5NR4A1CDK2
Phenolsulphonic Acid SCHEMBL11593234 0.95 PTGS1 (0.52) PTGS1PKLRDUSP5NR4A1CDK2
Phenolsulphonic Acid SCHEMBL5404273 0.95 PTGS1 (0.52) PTGS1PKLRDUSP5NR4A1CDK2
Phenolsulphonic Acid SCHEMBL1394635 0.95 PTGS1 (0.52) PTGS1PKLRDUSP5NR4A1CDK2
Phenolsulphonic Acid SCHEMBL20534105 0.95 PTGS1 (0.52) PTGS1PKLRDUSP5NR4A1CDK2
Phenolsulphonic Acid SCHEMBL6619287 0.95 PTGS1 (0.52) PTGS1PKLRDUSP5NR4A1CDK2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0893514-B1 Tin-silver alloy plating solution and method of plating with said plating solution NAGANO PREFECTURE (JP) 2003-04-02 EP claimed
US-5902472-A FOR ELECTRODEPOSITION OF A TIN-SILVER ALLOY WITH A HIGH CURRENT EFFICIENCY AND WITHOUT USING A CYANIDE MATERIAL, SAID PLATING SOLUTION COMPRISING A TIN COMPOUND, A SILVER COMPOUND, A PYROPHOSPHORIC ACID AND AN IODIC COMPOUND NAGANOKEN AND SHINKO ELECTRIC INDUSTRIES CO., LTD. (JP) 1999-05-11 US claimed
EP-0893514-A2 Aqueous solution for forming metallic complex, tin-silver alloy plating solution, and method of plating with said plating solution Naganoken (JP) 1999-01-27 EP claimed
EP-0818563-A1 AQUEOUS SOLUTION FOR FORMING METAL COMPLEXES, TIN-SILVER ALLOY PLATING BATH, AND PROCESS FOR PRODUCING PLATED OBJECT USING THE PLATING BATH Naganoken (JP) 1998-01-14 EP claimed
CN-117737716-A Plating method for silver sintering connection, plating film, substrate for power module, semiconductor element, and semiconductor device 上村工业株式会社 2024-03-22 CN disclosed
US-11920255-B2 Composite plated product and method for producing same DOWA METALTECH CO., LTD. (JP) 2024-03-05 US disclosed
CN-114144544-A Composite plated article and method for producing the same 同和金属技术有限公司 2022-03-04 CN disclosed
US-11225726-B2 Composite plated product and method for producing same DOWA METALTECH CO., LTD. (JP) 2022-01-18 US disclosed
US-11208730-B2 Composite plated product and method for producing same DOWA METALTECH CO., LTD. (JP) 2021-12-28 US disclosed
CN-111705340-A Composite plated article and method of making same 同和金属技术有限公司 2020-09-25 CN disclosed
US-20200299852-A1 COMPOSITE PLATED PRODUCT AND METHOD FOR PRODUCING SAME DOWA METALTECH CO., LTD. (JP) 2020-09-24 US disclosed
US-20200232110-A1 COMPOSITE PLATED PRODUCT AND METHOD FOR PRODUCING SAME DOWA METALTECH CO., LTD. (JP) 2020-07-23 US disclosed
CN-100533785-C Plating method ROHM & HAAS ELECT MAT (US) 2009-08-26 CN disclosed
US-20080035489-A1 Plating process ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2008-02-14 US disclosed
CN-101123281-A Plating method ROHM & HAAS ELECT MAT (US) 2008-02-13 CN disclosed
EP-1865563-A2 Light assisted electro plating process Rohm and Haas Electronic Materials, L.L.C. (US) 2007-12-12 EP disclosed
EP-0893514-B1 Tin-silver alloy plating solution and method of plating with said plating solution NAGANO PREFECTURE (JP) 2003-04-02 EP disclosed
US-5902472-A FOR ELECTRODEPOSITION OF A TIN-SILVER ALLOY WITH A HIGH CURRENT EFFICIENCY AND WITHOUT USING A CYANIDE MATERIAL, SAID PLATING SOLUTION COMPRISING A TIN COMPOUND, A SILVER COMPOUND, A PYROPHOSPHORIC ACID AND AN IODIC COMPOUND NAGANOKEN AND SHINKO ELECTRIC INDUSTRIES CO., LTD. (JP) 1999-05-11 US disclosed
EP-0893514-A2 Aqueous solution for forming metallic complex, tin-silver alloy plating solution, and method of plating with said plating solution Naganoken (JP) 1999-01-27 EP disclosed
EP-0818563-A1 AQUEOUS SOLUTION FOR FORMING METAL COMPLEXES, TIN-SILVER ALLOY PLATING BATH, AND PROCESS FOR PRODUCING PLATED OBJECT USING THE PLATING BATH Naganoken (JP) 1998-01-14 EP disclosed