Acetic Acid

Acetic Acid

SCHEMBL1860419

CC(=O)O.CCCOC

nearest known ligand 0.00

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Known targets — ChEMBL curated mechanism

ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bicarbonate SCHEMBL1581293 0.91
Methacrylic Acid SCHEMBL28854125 0.85 TSHR (0.45)
Acetic Acid SCHEMBL356157 0.85 ALDH1A1 (0.38)
Acetic Acid SCHEMBL774951 0.84 FFAR3 (0.50)
Acetic Acid SCHEMBL7261899 0.84 FFAR3 (0.50)
Propylene Glycol SCHEMBL7140506 0.84 TDP1 (0.42)
Acetic Acid SCHEMBL9788284 0.83 ALDH1A1 (0.54)
Acetic Acid SCHEMBL27789593 0.81 ALDH1A1 (0.54)
Methoxyacetic Acid SCHEMBL27624149 0.81 ALDH1A1 (0.43)
Methyl Alcohol SCHEMBL20494944 0.81

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119817196-A Pixel isolation structure and manufacturing method thereof 应用材料公司 2025-04-11 CN disclosed
CN-117836253-A Method and energy device for forming sintered compositions 康宁公司 2024-04-05 CN disclosed
WO-2024059434-A1 PIXEL ISOLATION STRUCTURES AND METHODS OF MAKING THEM APPLIED MATERIALS, INC. (US) 2024-03-21 WO disclosed
US-20240096854-A1 PIXEL ISOLATION STRUCTURES AND METHODS OF MAKING THEM APPLIED MATERIALS, INC. (US) 2024-03-21 US disclosed
CN-114667486-A PAG-free positive-working chemically amplified resist composition and method of using the same 默克专利股份有限公司 2022-06-24 CN disclosed
CN-112654928-A Positive photosensitive material 默克专利股份有限公司 2021-04-13 CN disclosed
US-20110104501-A1 Emulsions Useful for Coatings and Coating Additives The Wood Coatings Research Group, (US) 2011-05-05 US disclosed
EP-1140373-A4 METHODS OF MANUFACTURING VOIDFREE RESIN IMPREGNATED WEBS ISOLA LAMINATE SYSTEMS CORP (US) 2003-01-08 EP disclosed
EP-1140373-A1 METHODS OF MANUFACTURING VOIDFREE RESIN IMPREGNATED WEBS Isola Laminate Systems Corporation (US) 2001-10-10 EP disclosed
WO-2000040345-A1 METHODS OF MANUFACTURING VOIDFREE RESIN IMPREGNATED WEBS ISOLA LAMINATE SYSTEMS CORP. (US) 2000-07-13 WO disclosed
US-6083855-A PLACING SUBSTRATE INTO IMPREGNATION ZONE INCLUDING SOLVENT CONTAINING CURABLE RESIN; CURING; DIPPING IN SOLVENT HAVING LOW SOLIDS; DIPPING IN SOLVENT HAVING HIGH SOLIDS; REMOVING MOISTURE; HEATING SUBSTRATE BEFORE SECOND IMPREGNATION STEP ISOLA LAMINATE SYSTEMS CORP. (US) 2000-07-04 US disclosed