SCHEMBL1862397

SCHEMBL1862397

C1CCCCCCCCC1.C=C(C(=O)O)C(C)C

nearest known ligand 0.40

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.32
MAPT P10636 1/20 0.32
XBP1 P17861 1/20 0.32
ATM Q13315 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
SLC7A5 Q01650 1/20 0.32
TP53 P04637 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Cyclohexane SCHEMBL65475 1.00 LMNA (0.32) LMNAMAPTXBP1ATMSMN1; SMN2
SCHEMBL13388280 1.00 LMNA (0.32) LMNAMAPTXBP1ATMSMN1; SMN2
Cyclopentane SCHEMBL4219993 1.00 LMNA (0.32) LMNAMAPTXBP1ATMSMN1; SMN2
SCHEMBL153454 1.00 LMNA (0.32) LMNAMAPTXBP1ATMSMN1; SMN2
SCHEMBL1728488 1.00 LMNA (0.32) LMNAMAPTXBP1ATMSMN1; SMN2
SCHEMBL924888 1.00 LMNA (0.32) LMNAMAPTXBP1ATMSMN1; SMN2
SCHEMBL23313 0.91
SCHEMBL27907562 0.88
Ammonia Solution, Strong SCHEMBL4952162 0.88
Ethylene SCHEMBL27760243 0.88 TP53 (0.35) LMNAMAPTXBP1ATMSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024018040-A1 CURABLE COMPOSITIONS ARKEMA FRANCE (FR) 2024-01-25 WO disclosed
WO-2022262422-A1 INK COMPOSITION FOR PHOTOCONVERSION LAYER AND PREPARATION METHOD THEREFOR, PHOTOCONVERSION LAYER, AND COLOR FILTER 苏州星烁纳米科技有限公司 2022-12-22 WO disclosed
US-11219125-B2 Transparent conductor and display device including same SAMSUNG SDI CO., LTD. (KR) 2022-01-04 US disclosed
WO-2020039304-A1 CURABLE COMPOSITIONS FOR FORMING LIGHT SCATTERING LAYERS 3M INNOVATIVE PROPERTIES COMPANY (US) 2020-02-27 WO disclosed
US-20190258334-A1 TRANSPARENT CONDUCTOR AND DISPLAY DEVICE INCLUDING SAME SAMSUNG SDI CO., LTD. (KR) 2019-08-22 US disclosed
US-10366799-B2 Transparent conductor, method for preparing the same and display apparatus including the same SAMSUNG SDI CO., LTD. (KR) 2019-07-30 US disclosed
CN-106104706-B Transparent conductor, its manufacturing method and the optical display devices including it 三星SDI株式会社 2019-02-15 CN disclosed
US-10115495-B2 Transparent conductor and optical display including the same SAMSUNG SDI CO., LTD. (KR) 2018-10-30 US disclosed
US-9844129-B2 Transparent conductor and optical display apparatus comprising the same SAMSUNG SDI CO., LTD. (KR) 2017-12-12 US disclosed
US-9754698-B2 Transparent conductor, method for preparing the same, and optical display including the same SAMSUNG SDI CO., LTD. (KR) 2017-09-05 US disclosed
US-20150118508-A1 TRANSPARENT CONDUCTOR, METHOD FOR PREPARING THE SAME, AND OPTICAL DISPLAY INCLUDING THE SAME SAMSUNG SDI CO., LTD. (KR) 2015-04-30 US disclosed
US-20150111048-A1 TRANSPARENT CONDUCTOR AND OPTICAL DISPLAY INCLUDING THE SAME SAMSUNG SDI CO., LTD. (KR) 2015-04-23 US disclosed
US-8968846-B2 Thermal transfer film and organic electroluminescent display manufactured using the same CHEIL INDUSTRIES, INC (KR) 2015-03-03 US disclosed
US-20150036298-A1 TRANSPARENT CONDUCTOR AND OPTICAL DISPLAY APPARATUS COMPRISING THE SAME SAMSUNG SDI CO., LTD. (KR) 2015-02-05 US disclosed
EP-2832785-A1 Transparent conductor and optical display apparatus comprising the same Samsung SDI Co., Ltd. (KR) 2015-02-04 EP disclosed
US-20140186587-A1 TRANSPARENT CONDUCTOR AND APPARATUS INCLUDING THE SAME CHEIL INDUSTRIES INC. (KR) 2014-07-03 US disclosed
US-20130171379-A1 THERMAL TRANSFER FILM AND ORGANIC ELECTROLUMINESCENT DISPLAY MANUFACTURED USING THE SAME CHEIL INDUSTRIES, INC. (KR) 2013-07-04 US disclosed
US-7935472-B2 Photo-curable resin composition and a method for forming a pattern using the same HITACHI CHEMICAL COMPANY, LTD. (JP) 2011-05-03 US disclosed
US-20070160937-A1 Photocurable resin composition and a method for forming a pattern HITACHI CHEMICAL COMPANY, LTD. (JP) 2007-07-12 US disclosed
US-20070065757-A1 Photo-curable resin composition and a method for forming a pattern using the same HITACHI CHEMICAL CO., LTD. (JP) 2007-03-22 US disclosed