SCHEMBL18635909

SCHEMBL18635909

CSC(C)c1ccc(SCc2ccc(C(C)=O)cc2)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 8/20 0.43
MEN1 O00255 7/20 0.43
SMN1; SMN2 Q16637 6/20 0.43
RAB9A P51151 3/20 0.43
L3MBTL1 Q9Y468 2/20 0.43
NPC1 O15118 1/20 0.43
LMNA P02545 7/20 0.43
HPGD P15428 7/20 0.43
MAPT P10636 6/20 0.43
ALDH1A1 P00352 6/20 0.42
HTT P42858 3/20 0.42
HDAC3 O15379 2/20 0.41
NCOR1 O75376 2/20 0.41
HDAC1 Q13547 2/20 0.41
HDAC2 Q92769 2/20 0.41
NPSR1 Q6W5P4 3/20 0.40
RXFP1 Q9HBX9 1/20 0.40
KDM4E B2RXH2 1/20 0.40
SLC6A4 P31645 1/20 0.39
CYP1A2 P05177 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL734544 0.83 HPGD (0.48) KMT2ASMN1; SMN2RAB9AL3MBTL1NPC1
SCHEMBL11700132 0.77 KMT2A (0.67) KMT2AMEN1SMN1; SMN2RAB9AL3MBTL1
SCHEMBL11698574 0.77 LMNA (0.59) KMT2AMEN1SMN1; SMN2RAB9AL3MBTL1
SCHEMBL11698478 0.75 APP (0.62) KMT2AMEN1SMN1; SMN2RAB9AL3MBTL1
SCHEMBL11961686 0.74 KMT2A (0.59) KMT2AMEN1SMN1; SMN2RAB9AL3MBTL1
SCHEMBL21955444 0.70 KMT2A (0.61) KMT2AMEN1SMN1; SMN2RAB9AL3MBTL1
SCHEMBL12267898 0.70 HPGD (0.50) KMT2ASMN1; SMN2RAB9AL3MBTL1NPC1
SCHEMBL10871374 0.70 KMT2A (0.61) KMT2AMEN1SMN1; SMN2L3MBTL1LMNA
SCHEMBL759442 0.70 HPGD (0.45) KMT2ASMN1; SMN2RAB9AL3MBTL1NPC1
SCHEMBL1717973 0.69 HSD17B10 (0.47) KMT2AMEN1SMN1; SMN2RAB9AL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2771740-B1 PHOTOSENSITIVE NEGATIVE RESIN COMPOSITION, FINE STRUCTURE, PRODUCTION PROCESS OF FINE STRUCTURE AND LIQUID EJECTION HEAD CANON KK (JP) 2017-03-15 EP disclosed