Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHEK1 | O14757 | 1/20 | 0.67 |
| ▸ | DAPK3 | O43293 | 1/20 | 0.67 |
| ▸ | RET | P07949 | 1/20 | 0.67 |
| ▸ | PDGFRB | P09619 | 1/20 | 0.67 |
| ▸ | PIM1 | P11309 | 1/20 | 0.67 |
| ▸ | PDGFRA | P16234 | 1/20 | 0.67 |
| ▸ | KDR | P35968 | 1/20 | 0.67 |
| ▸ | MAPK8 | P45983 | 1/20 | 0.67 |
| ▸ | RPS6KA3 | P51812 | 1/20 | 0.67 |
| ▸ | LIMK1 | P53667 | 1/20 | 0.67 |
| ▸ | TYRO3 | Q06418 | 1/20 | 0.67 |
| ▸ | MAPK14 | Q16539 | 1/20 | 0.67 |
| ▸ | LRRK2 | Q5S007 | 1/20 | 0.67 |
| ▸ | AURKB | Q96GD4 | 1/20 | 0.67 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.48 |
| ▸ | ALOX12 | P18054 | 2/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.48 |
| ▸ | HPGD | P15428 | 2/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18643107 | 0.98 | CHEK1 (0.64) | CHEK1DAPK3RETPDGFRBPIM1 | |
| SCHEMBL19847042 | 0.98 | CHEK1 (0.64) | CHEK1DAPK3RETPDGFRBPIM1 | |
| SCHEMBL7783812 | 0.93 | CHEK1 (0.75) | CHEK1DAPK3RETPDGFRBPIM1 | |
| SCHEMBL18544652 | 0.90 | CHEK1 (0.72) | CHEK1DAPK3RETPDGFRBPIM1 | |
| SCHEMBL13099334 | 0.88 | CHEK1 (0.64) | CHEK1DAPK3RETPDGFRBPIM1 | |
| SCHEMBL18976735 | 0.87 | CHEK1 (0.53) | CHEK1DAPK3RETPDGFRBPIM1 | |
| SCHEMBL18746058 | 0.86 | CHEK1 (0.50) | CHEK1DAPK3RETPDGFRBPIM1 | |
| SCHEMBL19880363 | 0.86 | CHEK1 (0.67) | CHEK1DAPK3RETPDGFRBPIM1 | |
| SCHEMBL13994348 | 0.86 | CHEK1 (0.50) | CHEK1DAPK3RETPDGFRBPIM1 | |
| SCHEMBL69586 | 0.85 | ALDH1A1 (0.56) | CHEK1DAPK3RETPDGFRBPIM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3062151-B1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM | MITSUBISHI GAS CHEMICAL CO (JP) | 2021-05-05 | — | — | EP | disclosed |
| EP-2080750-B1 | RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2020-07-29 | — | — | EP | disclosed |
| EP-2743249-B1 | CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-07-24 | — | — | EP | disclosed |
| EP-2505576-B1 | CYCLIC COMPOUND, PROCESS FOR PRODUCTION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-04-24 | — | — | EP | disclosed |
| EP-3007004-B1 | RESIST COMPOSITION | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-04-17 | — | — | EP | disclosed |
| EP-2476662-B1 | CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN | MITSUBISHI GAS CHEMICAL CO (JP) | 2018-05-30 | — | — | EP | disclosed |
| EP-3279190-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYPHENOL COMPOUND USED THEREIN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-02-07 | — | — | EP | disclosed |
| EP-3279728-A1 | RESIST BASE MATERIAL, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-02-07 | — | — | EP | disclosed |
| EP-3279730-A1 | RADIATION-SENSITIVE COMPOSITION, AMORPHOUS FILM, AND RESIST PATTERN-FORMATION METHOD | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-02-07 | — | — | EP | disclosed |
| EP-3279731-A1 | RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-02-07 | — | — | EP | disclosed |
| WO-2017188452-A1 | COMPOSITION FOR FORMING OPTICAL COMPONENT, AND CURED PRODUCT OF SAME | 三菱瓦斯化学株式会社 | 2017-11-02 | — | — | WO | disclosed |
| EP-2743769-B1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYPHENOL COMPOUND USED THEREIN, AND ALCOHOL COMPOUND CAPABLE OF BEING DERIVED THEREFROM | MITSUBISHI GAS CHEMICAL CO (JP) | 2017-03-22 | — | — | EP | disclosed |
| WO-2017043561-A1 | COMPOUND, RESIN, RESIST COMPOSITION OR RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING AMORPHOUS FILM, MATERIAL FOR FORMING LITHOGRAPHIC UNDERLAYER FILM, COMPOSTION FOR FORMING LITHOGRAPHIC UNDERLAYER FILM, METHOD FOR FORMING CIRCUIT PATTERN, AND PURIFICATION METHOD | 三菱瓦斯化学株式会社 | 2017-03-16 | — | — | WO | disclosed |