SCHEMBL18644376

SCHEMBL18644376

C=C(C)C(=O)COCC1CC2CC1CC2(O)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14533295 0.82 ALDH1A1 (0.39) —
SCHEMBL22432365 0.75 — —
SCHEMBL18644555 0.75 — —
SCHEMBL4974897 0.70 — —
SCHEMBL20215493 0.70 — —
SCHEMBL23974058 0.68 — —
SCHEMBL23963205 0.67 TSHR (0.37) —
SCHEMBL18401068 0.65 ALDH1A1 (0.42) —
SCHEMBL19245896 0.65 — —
SCHEMBL18457097 0.65 ALDH1A1 (0.37) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170075218-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-03-16 — — US disclosed
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