SCHEMBL1866176

SCHEMBL1866176

C=CC(=O)OC(C)C(C)OC(=O)c1ccccc1C(=O)OC(C)C(C)OC(=O)C=C

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.43
ALDH1A1 P00352 4/20 0.43
CYP3A4 P08684 1/20 0.43
NPC1 O15118 1/20 0.40
THRB P10828 1/20 0.36
HCAR2 Q8TDS4 1/20 0.36
KMT2A Q03164 1/20 0.35
ADRB2 P07550 1/20 0.35
ADRB1 P08588 1/20 0.35
ADRB3 P13945 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
HSD17B10 Q99714 1/20 0.35
SCN1A P35498 1/20 0.35
SCN2A Q99250 1/20 0.35
SCN3A Q9NY46 1/20 0.35
KDM4E B2RXH2 1/20 0.35
LMNA P02545 1/20 0.34
IRAK4 Q9NWZ3 1/20 0.34
PDCD1 Q15116 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2813872 0.94 ALDH1A1 (0.51) TSHRALDH1A1CYP3A4NPC1THRB
SCHEMBL301790 0.86 TSHR (0.43) TSHRALDH1A1CYP3A4NPC1THRB
SCHEMBL10618000 0.82 ALDH1A1 (0.44) TSHRALDH1A1CYP3A4NPC1KMT2A
SCHEMBL21603039 0.82 TSHR (0.40) TSHRALDH1A1CYP3A4NPC1THRB
SCHEMBL27922309 0.81 ALDH1A1 (0.43) TSHRALDH1A1CYP3A4NPC1KMT2A
SCHEMBL17924927 0.81 TSHR (0.39) TSHRALDH1A1CYP3A4NPC1THRB
SCHEMBL301791 0.81 ALDH1A1 (0.48) TSHRALDH1A1CYP3A4NPC1THRB
SCHEMBL20481917 0.81 TSHR (0.45) TSHRALDH1A1CYP3A4KMT2ATDP1
SCHEMBL35051 0.81 TSHR (0.54) TSHRALDH1A1CYP3A4ADRB2ADRB1
SCHEMBL28880043 0.81 TSHR (0.46) TSHRALDH1A1CYP3A4THRBADRB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107429096-B Ink set and image forming method 富士胶片株式会社 2020-11-17 CN disclosed
EP-3001472-B1 ORGANIC SEMICONDUCTOR COMPOSITION, ORGANIC THIN-FILM TRANSISTOR, ELECTRONIC PAPER, AND DISPLAY DEVICE FUJIFILM CORP (JP) 2020-09-02 EP disclosed
EP-3382745-A1 COMPOSITION FOR FORMING GATE INSULATING FILM, ORGANIC THIN FILM TRANSISTOR, ELECTRONIC PAPER, AND DISPLAY DEVICE FUJIFILM Corporation (JP) 2018-10-03 EP disclosed
US-10014474-B2 Composition for forming gate insulating film, organic thin film transistor, electronic paper, and display device FUJIFILM CORPORATION (JP) 2018-07-03 US disclosed
US-10008301-B2 Organic semiconductor composition, organic thin-film transistor, electronic paper, and display device FUJIFILM CORPORATION (JP) 2018-06-26 US disclosed
US-9929348-B2 Organic semiconductor composition comprising organic semiconductor material and polymer compound FUJIFILM CORPORATION (JP) 2018-03-27 US disclosed
EP-2236647-B1 PROCESS FOR ADSORBING PLATING CATALYSTS, PROCESS FOR PRODUCTION OF SUBSTRATES PROVIDED WITH METAL LAYERS AND PLATING CATALYST CONTAINING FLUID FOR USE IN BOTH PROCESSES FUJIFILM CORP (JP) 2018-02-21 EP disclosed
CN-103588930-B Nitrile group-containing polymer, method for synthesizing same, composition using nitrile group-containing polymer, and laminate 富士胶片株式会社 2017-04-26 CN disclosed
EP-3007214-A1 COMPOSITION FOR FORMING GATE INSULATING FILM, ORGANIC THIN FILM TRANSISTOR, ELECTRONIC PAPER, AND DISPLAY DEVICE Fujifilm Corporation (JP) 2016-04-13 EP disclosed
EP-3001471-A1 ORGANIC SEMICONDUCTOR COMPOSITION, ORGANIC THIN-FILM TRANSISTOR, ELECTRONIC PAPER, AND DISPLAY DEVICE Fujifilm Corporation (JP) 2016-03-30 EP disclosed
CN-105229814-A Organic semiconductor composition, OTFT and Electronic Paper and display unit FUJIFILM CORP 2016-01-06 CN disclosed
US-8293846-B2 Composition for forming layer to be plated, method of producing metal pattern material, metal pattern material FUJIFILM CORPORATION (JP) 2012-10-23 US disclosed
US-8273463-B2 Multilayer film for plating, method of manufacturing metal film-coated material and metal film-coated material FUJIFILM CORPORATION (JP) 2012-09-25 US disclosed
US-20110104454-A1 COMPOSITION FOR FORMING LAYER TO BE PLATED, METHOD OF PRODUCING METAL PATTERN MATERIAL, AND METAL PATTERN MATERIAL FUJIFILM CORPORATION (JP) 2011-05-05 US disclosed
US-20100279012-A1 METHOD FOR ADSORBING PLATING CATALYST, METHOD FOR PREPARING SUBSTRATE PROVIDED WITH METAL LAYER, AND PLATING CATALYST SOLUTION USED IN THE SAME FUJIFILM CORPORATION (JP) 2010-11-04 US disclosed
EP-2236647-A1 PROCESS FOR ADSORBING PLATING CATALYSTS, PROCESS FOR PRODUCTION OF SUBSTRATES PROVIDED WITH METAL LAYERS AND PLATING CATALYST CONTAINING FLUID FOR USE IN BOTH PROCESSES FUJIFILM Corporation (JP) 2010-10-06 EP disclosed
US-20100247880-A1 NOVEL COPOLYMER, NOVEL COPOLYMER-CONTAINING COMPOSITION, LAMINATE BODY, METHOD OF PRODUCING METAL FILM-COATED MATERIAL, METAL FILM-COATED MATERIAL, METHOD OF PRODUCING METALLIC PATTERN-BEARING MATERIAL AND METALLIC PATTERN-BEARING MATERIAL FUJIFILM CORPORATION (JP) 2010-09-30 US disclosed
US-20100080964-A1 COMPOSITION FOR FORMING LAYER TO BE PLATED, METHOD OF PRODUCING METAL PATTERN MATERIAL, METAL PATTERN MATERIAL FUJIFILM CORPORATION (JP) 2010-04-01 US disclosed
US-20090269599-A1 MULTILAYER FILM FOR PLATING, METHOD OF MANUFACTURING METAL FILM-COATED MATERIAL AND METAL FILM-COATED MATERIAL FUJIFILM CORPORATION (JP) 2009-10-29 US disclosed
US-20090155553-A1 Method of manufacturing surface metal film material, surface metal film material, method of manufacturing patterned metal material, patterned metal material, and polymer layer-forming composition FUJIFILM CORPORATION (JP) 2009-06-18 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10014474-B2 Composition for forming gate insulating film, organic thin film transistor, electronic paper, and display device TEC, EPCAM, MIF TSHR 4103/4885ALDH1A1 3275/4885CYP3A4 2651/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.