⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL416907 | 0.69 | — | — | |
| SCHEMBL15858201 | 0.65 | — | — | |
| SCHEMBL9479124 | 0.63 | — | — | |
| SCHEMBL9479118 | 0.61 | — | — | |
| SCHEMBL5610414 | 0.60 | — | — | |
| SCHEMBL8313361 | 0.53 | — | — | |
| SCHEMBL9026428 | 0.53 | — | — | |
| SCHEMBL9865874 | 0.53 | — | — | |
| SCHEMBL5334854 | 0.53 | — | — | |
| SCHEMBL7407955 | 0.53 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113169060-B | Chamfering part treating agent composition and method for manufacturing wafer | 中央硝子株式会社 | 2025-04-01 | — | — | CN | disclosed |
| CN-119278503-A | Substrate processing method and substrate manufacturing method | 中央硝子株式会社 | 2025-01-07 | — | — | CN | disclosed |
| CN-119278504-A | Substrate processing method and substrate manufacturing method | 中央硝子株式会社 | 2025-01-07 | — | — | CN | disclosed |
| CN-118451534-A | Film-forming composition and method for producing substrate | 中央硝子株式会社 | 2024-08-06 | — | — | CN | disclosed |
| US-10941301-B2 | Surface treatment method, surface treatment agent, and method for forming film region-selectively on substrate | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-03-09 | — | — | US | disclosed |
| US-20190203054-A1 | SURFACE TREATMENT METHOD, SURFACE TREATMENT AGENT, AND METHOD FOR FORMING FILM REGION-SELECTIVELY ON SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-07-04 | — | — | US | disclosed |
| US-10093815-B2 | Surface treatment agent and surface treatment method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-10-09 | — | — | US | disclosed |
| US-20170088722-A1 | SURFACE TREATMENT AGENT AND SURFACE TREATMENT METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-03-30 | — | — | US | disclosed |