⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18663271 | 0.69 | — | — | |
| SCHEMBL8313361 | 0.69 | — | — | |
| SCHEMBL10942744 | 0.69 | — | — | |
| SCHEMBL7407955 | 0.69 | — | — | |
| SCHEMBL9026428 | 0.69 | — | — | |
| SCHEMBL15858201 | 0.69 | — | — | |
| SCHEMBL9865874 | 0.69 | — | — | |
| SCHEMBL5334854 | 0.69 | — | — | |
| Hydrochloric Acid SCHEMBL9728192 | 0.67 | — | — | |
| SCHEMBL9479118 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 825 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12227610-B2 | Aqueous dispersion comprising polyurethane or polyurethane-urea, preparation method therefor and use thereof | WANHUA CHEMICAL GROUP CO., LTD. (CN) | 2025-02-18 | — | — | US | claimed |
| CN-118244583-A | Negative photosensitive polyimide precursor resin composition | 深圳先进电子材料国际创新研究院 | 2024-06-25 | — | — | CN | claimed |
| CN-118240213-A | Negative photosensitive polyimide precursor and composition thereof | 深圳先进电子材料国际创新研究院 | 2024-06-25 | — | — | CN | claimed |
| CN-114409864-B | Aqueous polyurethane or polyurethane-urea dispersion, method for the production and use thereof | 万华化学集团股份有限公司 | 2023-12-19 | — | — | CN | claimed |
| CN-114634677-B | Aqueous dispersion composition and preparation method and application thereof | 万华化学集团股份有限公司 | 2023-05-26 | — | — | CN | claimed |
| US-20220363804-A1 | AQUEOUS DISPERSION COMPRISING POLYURETHANE OR POLYURETHANE-UREA, PREPARATION METHOD THEREFOR AND USE THEREOF | WANHUA CHEMICAL (NINGBO) CO., LTD. (CN) | 2022-11-17 | — | — | US | claimed |
| CN-112979900-B | Aqueous polyurethane or polyurethane-urea dispersions, method for the production thereof and use thereof | 万华化学集团股份有限公司 | 2022-08-05 | — | — | CN | claimed |
| EP-4026864-A1 | AQUEOUS DISPERSION COMPRISING POLYURETHANE OR POLYURETHANE-UREA, PREPARATION METHOD THEREFOR AND USE THEREOF | Wanhua Chemical Group Co., Ltd. (CN) | 2022-07-13 | — | — | EP | claimed |
| EP-4013903-A1 | COMPOSITIONS AND METHODS USING SAME FOR NON-CONFORMAL DEPOSITION OF SILICON-CONTAINING FILMS | Versum Materials US, LLC (US) | 2022-06-22 | — | — | EP | claimed |
| CN-114634677-A | Aqueous dispersion composition and preparation method and application thereof | 万华化学集团股份有限公司 | 2022-06-17 | — | — | CN | claimed |
| WO-2005105864-A1 | HETEROCYCLIC SUBSTITUTED METALLOCENE COMPOUNDS FOR OLEFIN POLYMERIZATION | EXXONMOBIL CHEMICAL PATENTS INC. (US) | 2005-11-10 | — | — | WO | claimed |
| EP-1548075-A2 | Compositons and methods for barrier removal | Rohm and Haas Electronic Materials CMP Holdings, Inc. (US) | 2005-06-29 | — | — | EP | claimed |
| CN-1630045-A | Compositions and methods for barrier removal | ROHM & HAAS ELECT MAT (US) | 2005-06-22 | — | — | CN | claimed |
| US-20050097825-A1 | Compositions and methods for a barrier removal | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. | 2005-05-12 | — | — | US | claimed |
| US-5985512-A | BASE RESIN, PHOTOACID GENERATOR, SOLVENT AND NITRONENOUS ORGANIC COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-11-16 | — | — | US | claimed |
| US-5646198-A | MIXTURE INCLUDES POLYMER, BENZOTRIAZOLE OR TRIAZOLE COMPOUND, AND COMPOUND WITH HYDROPHOBIC AND HYDROPHILIC PARTS; STORAGE STABILITY; MARINE STRUCTURES | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1997-07-08 | — | — | US | claimed |
| US-4642221-A | AROMATIC TRIAZOLES AND IMINODICARBOXYLIC ACID DERIVATIVES | ATLANTIC RICHFIELD COMPANY (US) | 1987-02-10 | — | — | US | claimed |
| US-4321395-A | Preparation of acetanilides | BASF AKTIENGESELLSCHAFT (DE) | 1982-03-23 | — | — | US | claimed |
| US-4105656-A | PROCESS FOR PREPARING 3-N-MONOSUBSTITUTED AMINO-4-SUBSTITUTED-5-PYRAZOLONES | FUJI PHOTO FILM CO., LTD. (JP) | 1978-08-08 | — | — | US | claimed |
| US-3948703-A | Method of chemically polishing copper and copper alloy | TOKAI DENKA KOGYO KABUSHIKI KAISHA (JA) | 1976-04-06 | — | — | US | claimed |