SCHEMBL18668795

SCHEMBL18668795

CCC(OC(=O)c1ccccc1C)C(=O)O

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 3/20 0.46
KDM4E B2RXH2 1/20 0.45
KMT2A Q03164 5/20 0.44
MEN1 O00255 4/20 0.44
TSHR P16473 2/20 0.44
NPC1 O15118 3/20 0.44
RAB9A P51151 2/20 0.44
UTS2R Q9UKP6 1/20 0.44
ADRB2 P07550 2/20 0.43
ADRB1 P08588 2/20 0.43
ADRB3 P13945 2/20 0.43
ERCC5 P28715 1/20 0.42
FEN1 P39748 1/20 0.42
LMNA P02545 2/20 0.41
MAPT P10636 2/20 0.41
MAPK1 P28482 1/20 0.41
ALDH1A1 P00352 2/20 0.40
HTT P42858 2/20 0.40
CASP3 P42574 1/20 0.40
SENP8 Q96LD8 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10626466 0.90 TSHR (0.50) SMN1; SMN2KDM4ETSHRLMNAMAPK1
SCHEMBL10626470 0.85 ALDH1A1 (0.55) SMN1; SMN2KDM4EKMT2AMEN1TSHR
SCHEMBL18669147 0.84 UTS2R (0.46) SMN1; SMN2KDM4EKMT2ATSHRUTS2R
SCHEMBL18668782 0.83 MAPT (0.48) SMN1; SMN2KMT2ANPC1RAB9AADRB2
SCHEMBL18669051 0.81 HPGD (0.50) SMN1; SMN2KMT2ATSHRNPC1RAB9A
SCHEMBL28398051 0.80 PPARG (0.53) KDM4EKMT2AMEN1UTS2RADRB2
SCHEMBL27637585 0.80 SMN1; SMN2 (0.48) SMN1; SMN2KDM4EKMT2AMEN1TSHR
SCHEMBL13328208 0.80 SMN1; SMN2 (0.58) SMN1; SMN2KDM4EKMT2AMEN1TSHR
SCHEMBL4198767 0.80 TSHR (0.58) SMN1; SMN2KDM4EKMT2AMEN1TSHR
SCHEMBL4179476 0.80 TSHR (0.58) SMN1; SMN2KDM4EKMT2AMEN1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111240156-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2020-06-05 CN disclosed
EP-3353145-A1 PRODRUGS OF GAMMA-HYDROXYBUTYRIC ACID, COMPOSITIONS AND USES THEREOF XW Laboratories Inc. (KY) 2018-08-01 EP disclosed
WO-2017050259-A1 PRODRUGS OF GAMMA-HYDROXYBUTYRIC ACID, COMPOSITIONS AND USES THEREOF XW LABORATORIES INC. (KY) 2017-03-30 WO disclosed
WO-2017049470-A1 PRODRUGS OF GAMMA-HYDROXYBUTYRIC ACID, COMPOSITIONS AND USES THEREOF XW LABORATORIES INC. (CN) 2017-03-30 WO disclosed