Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.41 |
| ▸ | HPGD | P15428 | 3/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.41 |
| ▸ | CYP1A1 | P04798 | 1/20 | 0.41 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.41 |
| ▸ | ELANE | P08246 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | GUSB | P08236 | 1/20 | 0.30 |
| ▸ | THRB | P10828 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19224213 | 0.78 | ESR1 (0.36) | — | |
| SCHEMBL18891779 | 0.78 | — | — | |
| SCHEMBL8371940 | 0.77 | ALDH1A1 (0.50) | ALDH1A1HPGDHSD17B10CYP3A4TSHR | |
| SCHEMBL8371939 | 0.77 | ALDH1A1 (0.50) | ALDH1A1HPGDHSD17B10CYP3A4TSHR | |
| SCHEMBL20392352 | 0.72 | ALDH1A1 (0.39) | ALDH1A1HPGDHSD17B10CYP3A4TSHR | |
| SCHEMBL24520658 | 0.71 | ALDH1A1 (0.38) | ALDH1A1HPGDHSD17B10CYP3A4TSHR | |
| SCHEMBL23692079 | 0.70 | — | — | |
| Pyrene SCHEMBL10432153 | 0.70 | ALDH1A1 (0.65) | ALDH1A1HPGDHSD17B10CYP3A4TSHR | |
| SCHEMBL23043716 | 0.69 | ELANE (0.36) | ALDH1A1HPGDHSD17B10CYP3A4TSHR | |
| SCHEMBL15802618 | 0.69 | ELANE (0.36) | ALDH1A1HPGDHSD17B10CYP3A4TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9606438-B2 | Resist underlayer composition, method of forming patterns, and semiconductor integrated circuit device including the pattern | CHEIL INDUSTRIES, INC. (KR) | 2017-03-28 | — | — | US | disclosed |