⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14960539 | 0.85 | — | — | |
| SCHEMBL16501168 | 0.74 | — | — | |
| SCHEMBL14960473 | 0.74 | — | — | |
| SCHEMBL17366434 | 0.73 | — | — | |
| SCHEMBL17366427 | 0.72 | — | — | |
| SCHEMBL14768883 | 0.71 | — | — | |
| SCHEMBL20921299 | 0.68 | — | — | |
| SCHEMBL11996153 | 0.66 | — | — | |
| SCHEMBL499291 | 0.66 | ESR1 (0.42) | — | |
| SCHEMBL8930934 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10268117-B2 | Top-layer membrane formation composition and method for forming resist pattern using same | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2019-04-23 | — | — | US | disclosed |
| US-20170090288-A1 | TOP-LAYER MEMBRANE FORMATION COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING SAME | AZ ELECTRONIC MATERIALS S.À R.L. (LU) | 2017-03-30 | — | — | US | disclosed |
| US-20170090288-A1 | TOP-LAYER MEMBRANE FORMATION COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING SAME | AZ ELECTRONIC MATERIALS S.À R.L. (LU) | 2017-03-30 | — | — | US | disclosed |