⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31522812 | 0.71 | — | — | |
| SCHEMBL1856948 | 0.71 | — | — | |
| SCHEMBL22400781 | 0.71 | — | — | |
| SCHEMBL348415 | 0.71 | — | — | |
| SCHEMBL1856950 | 0.69 | — | — | |
| SCHEMBL21374371 | 0.69 | — | — | |
| SCHEMBL2486690 | 0.69 | — | — | |
| SCHEMBL3027290 | 0.69 | — | — | |
| SCHEMBL21947336 | 0.69 | — | — | |
| SCHEMBL21904 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111816559-B | Chemical for TSV/MEMS/power device etching | 乔治洛德方法研究和开发液化空气有限公司 | 2024-06-11 | — | — | CN | disclosed |
| CN-111816559-A | Chemistry for TSV/MEMS/power device etching | 乔治洛德方法研究和开发液化空气有限公司 | 2020-10-23 | — | — | CN | disclosed |
| CN-106663624-B | Chemistry for TSV/MEMS/power device etching | 乔治洛德方法研究和开发液化空气有限公司 | 2020-08-14 | — | — | CN | disclosed |
| US-10720335-B2 | Chemistries for TSV/MEMS/power device etching | AMERICAN AIR LIQUIDE, INC. (US) | 2020-07-21 | — | — | US | disclosed |
| US-20180366336-A1 | CHEMISTRIES FOR TSV/MEMS/POWER DEVICE ETCHING | AIR LIQUIDE AMERICAN (US) | 2018-12-20 | — | — | US | disclosed |
| US-10103031-B2 | Chemistries for TSV/MEMS/power device etching | L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Georges Claude (FR) | 2018-10-16 | — | — | US | disclosed |
| US-20180076046-A1 | CHEMISTRIES FOR TSV/MEMS/POWER DEVICE ETCHING | AIR LIQUIDE AMERICAN (US) | 2018-03-15 | — | — | US | disclosed |
| US-9892932-B2 | Chemistries for TSV/MEMS/power device etching | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) | 2018-02-13 | — | — | US | disclosed |
| EP-3158579-A1 | CHEMISTRIES FOR TSV/MEMS/POWER DEVICE ETCHING | L'Air Liquide Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) | 2017-04-26 | — | — | EP | disclosed |
| US-20170103901-A1 | CHEMISTRIES FOR TSV/MEMS/POWER DEVICE ETCHING | AMERICAN AIR LIQUIDE, INC. (US) | 2017-04-13 | — | — | US | disclosed |