⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL47430 | 0.85 | — | — | |
| SCHEMBL19261173 | 0.78 | — | — | |
| SCHEMBL3694984 | 0.77 | ALDH1A1 (0.34) | — | |
| SCHEMBL12365067 | 0.76 | ALDH1A1 (0.40) | — | |
| SCHEMBL14931210 | 0.74 | ALOX5AP (0.31) | — | |
| SCHEMBL6367067 | 0.73 | — | — | |
| SCHEMBL19188608 | 0.73 | — | — | |
| SCHEMBL10040434 | 0.73 | — | — | |
| SCHEMBL10305805 | 0.73 | — | — | |
| SCHEMBL18897885 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9851637-B2 | Resist composition, method of forming resist pattern, compound, and acid diffusion control agent | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-12-26 | — | — | US | disclosed |
| US-20170293223-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-10-12 | — | — | US | disclosed |
| US-20170097564-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-04-06 | — | — | US | disclosed |