SCHEMBL18763581

SCHEMBL18763581

C=CC[SiH](CC)O[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL44553 0.84
SCHEMBL29277801 0.77
SCHEMBL2588752 0.76 TSHR (0.37)
SCHEMBL51146 0.74
SCHEMBL31540455 0.70 TSHR (0.45)
SCHEMBL31540467 0.70 TSHR (0.45)
SCHEMBL18145504 0.70
Butane SCHEMBL19927389 0.69
SCHEMBL22654299 0.69
SCHEMBL169293 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9983481-B2 Stripper composition for removing photoresists and method for stripping photoresists using the same LG CHEM, LTD. (KR) 2018-05-29 US claimed
US-20170115573-A1 STRIPPER COMPOSITION FOR REMOVING PHOTORESISTS AND METHOD FOR STRIPPING PHOTORESISTS USING THE SAME LG CHEM, LTD. (KR) 2017-04-27 US claimed
CN-111989621-A Stripper composition for removing photoresist and method for stripping photoresist using the same 株式会社LG化学 2020-11-24 CN disclosed
US-9983481-B2 Stripper composition for removing photoresists and method for stripping photoresists using the same LG CHEM, LTD. (KR) 2018-05-29 US disclosed
US-20170115573-A1 STRIPPER COMPOSITION FOR REMOVING PHOTORESISTS AND METHOD FOR STRIPPING PHOTORESISTS USING THE SAME LG CHEM, LTD. (KR) 2017-04-27 US disclosed