⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL44552 | 0.88 | — | — | |
| SCHEMBL15273454 | 0.86 | — | — | |
| SCHEMBL7167941 | 0.81 | — | — | |
| SCHEMBL2588753 | 0.81 | TSHR (0.31) | — | |
| SCHEMBL51145 | 0.81 | — | — | |
| Ammonia Solution, Strong SCHEMBL7103249 | 0.79 | — | — | |
| Ammonia Solution, Strong SCHEMBL278220 | 0.79 | — | — | |
| SCHEMBL19466517 | 0.74 | — | — | |
| SCHEMBL9130033 | 0.74 | — | — | |
| SCHEMBL27852270 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9983481-B2 | Stripper composition for removing photoresists and method for stripping photoresists using the same | LG CHEM, LTD. (KR) | 2018-05-29 | — | — | US | claimed |
| US-20170115573-A1 | STRIPPER COMPOSITION FOR REMOVING PHOTORESISTS AND METHOD FOR STRIPPING PHOTORESISTS USING THE SAME | LG CHEM, LTD. (KR) | 2017-04-27 | — | — | US | claimed |
| CN-111989621-A | Stripper composition for removing photoresist and method for stripping photoresist using the same | 株式会社LG化学 | 2020-11-24 | — | — | CN | disclosed |
| US-9983481-B2 | Stripper composition for removing photoresists and method for stripping photoresists using the same | LG CHEM, LTD. (KR) | 2018-05-29 | — | — | US | disclosed |
| US-20170115573-A1 | STRIPPER COMPOSITION FOR REMOVING PHOTORESISTS AND METHOD FOR STRIPPING PHOTORESISTS USING THE SAME | LG CHEM, LTD. (KR) | 2017-04-27 | — | — | US | disclosed |