Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRM2 | P08172 | 5/20 | 0.34 |
| ▸ | CHRM1 | P11229 | 3/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | CHRM4 | P08173 | 2/20 | 0.32 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.32 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.31 |
| ▸ | CTDSP1 | Q9GZU7 | 1/20 | 0.31 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18768268 | 0.89 | CHRM2 (0.35) | CHRM2CHRM1MEN1CYP2D6KMT2A | |
| SCHEMBL15113771 | 0.86 | CHRM2 (0.31) | CHRM2CHRM1MEN1CYP2D6KMT2A | |
| SCHEMBL20161030 | 0.84 | GSR (0.30) | CHRM1 | |
| SCHEMBL18633945 | 0.80 | GSR (0.32) | CHRM2CHRM1CYP2D6CHRM4CHRM3 | |
| SCHEMBL19151708 | 0.79 | — | — | |
| SCHEMBL18758044 | 0.79 | CHRM2 (0.34) | CHRM2CHRM1MEN1CYP2D6KMT2A | |
| SCHEMBL75220 | 0.79 | CHRM2 (0.34) | CHRM2CHRM1MEN1CYP2D6KMT2A | |
| SCHEMBL19829285 | 0.78 | CHRM2 (0.38) | CHRM2CHRM1MEN1CYP2D6KMT2A | |
| SCHEMBL23974120 | 0.78 | CHRM2 (0.33) | CHRM2CHRM1MEN1CYP2D6KMT2A | |
| SCHEMBL25618017 | 0.78 | CHRM2 (0.33) | CHRM2CHRM1CHRM4CHRM3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20180024435-A1 | RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-01-25 | — | — | US | disclosed |
| US-20170108775-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-20 | — | — | US | disclosed |