SCHEMBL19829285

SCHEMBL19829285

CC(=O)OC1CC2CC1C1CCC(C)C21

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRM2 P08172 5/20 0.38
CHRM1 P11229 3/20 0.38
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
CYP2D6 P10635 2/20 0.38
CHRM4 P08173 2/20 0.35
CHRM3 P20309 2/20 0.35
APOBEC3A P31941 1/20 0.33
CTDSP1 Q9GZU7 1/20 0.33
APOBEC3G Q9HC16 1/20 0.33
TDP1 Q9NUW8 3/20 0.33
MAPT P10636 3/20 0.33
CA12 O43570 2/20 0.33
GMNN O75496 2/20 0.33
ALDH1A1 P00352 2/20 0.33
CA1 P00915 2/20 0.33
CA2 P00918 2/20 0.33
LMNA P02545 2/20 0.33
BLM P54132 2/20 0.33
CA9 Q16790 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3414722 0.81 CHRM2 (0.37) CHRM2CHRM1MEN1KMT2ACYP2D6
SCHEMBL10199946 0.81 CHRM2 (0.37) CHRM2CHRM1MEN1KMT2ACYP2D6
SCHEMBL9965125 0.81 CHRM2 (0.37) CHRM2CHRM1MEN1KMT2ACYP2D6
SCHEMBL12430188 0.80 CHRM2 (0.34) CHRM2CHRM1MEN1KMT2ACYP2D6
SCHEMBL18768271 0.78 CHRM2 (0.34) CHRM2CHRM1MEN1KMT2ACYP2D6
SCHEMBL75220 0.78 CHRM2 (0.34) CHRM2CHRM1MEN1KMT2ACYP2D6
SCHEMBL18758044 0.78 CHRM2 (0.34) CHRM2CHRM1MEN1KMT2ACYP2D6
SCHEMBL15147014 0.77 CHRM2 (0.41) CHRM2CHRM1MEN1KMT2ACYP2D6
SCHEMBL23974120 0.77 CHRM2 (0.33) CHRM2CHRM1MEN1KMT2ACYP2D6
SCHEMBL12536478 0.77 SGMS1 (0.30) TDP1MAPTCA12GMNNALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11009790-B2 Photoacid generator and photoresist composition including the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2021-05-18 US disclosed
US-10948822-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-03-16 US disclosed
US-20180031967-A1 PHOTOACID GENERATOR AND PHOTORESIST COMPOSITION INCLUDING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2018-02-01 US disclosed
US-20180031967-A1 PHOTOACID GENERATOR AND PHOTORESIST COMPOSITION INCLUDING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2018-02-01 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180031967-A1 PHOTOACID GENERATOR AND PHOTORESIST COMPOSITION INCLUDING THE SAME PAG1, CCNT1, NAT1 CHRM2 1121/4885CHRM1 339/4885MEN1 1217/4885
US-11009790-B2 Photoacid generator and photoresist composition including the same PAG1, CCNT1, NAT1 CHRM2 1121/4885CHRM1 339/4885MEN1 1217/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.