SCHEMBL1877700

SCHEMBL1877700

CCC(O)CC[O]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1871416 0.82
SCHEMBL1871409 0.80
SCHEMBL3885660 0.79 TSHR (0.47)
SCHEMBL29093054 0.79 TSHR (0.47)
SCHEMBL428320 0.79 TSHR (0.47)
SCHEMBL29093233 0.79 TSHR (0.47)
SCHEMBL619867 0.79 TSHR (0.47)
SCHEMBL1871548 0.79
SCHEMBL1873376 0.78 GPR84 (0.43)
SCHEMBL30912803 0.76 TSHR (0.44)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 80 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240124810-A1 SURFACE TREATMENT COMPOSITION, SURFACE TREATMENT METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE FUJIMI INCORPORATED (JP) 2024-04-18 US disclosed
CN-117778117-A Surface treatment composition, surface treatment method, and method for manufacturing semiconductor substrate 福吉米株式会社 2024-03-29 CN disclosed
CN-116891685-A Surface treatment composition, surface treatment method, and method for manufacturing semiconductor substrate 福吉米株式会社 2023-10-17 CN disclosed
CN-116891723-A Polishing composition, polishing method, and method for producing semiconductor substrate 福吉米株式会社 2023-10-17 CN disclosed
CN-116891789-A Surface treatment composition, surface treatment method, and method for manufacturing semiconductor substrate 福吉米株式会社 2023-10-17 CN disclosed
CN-116891684-A Surface treatment composition 福吉米株式会社 2023-10-17 CN disclosed
US-20230312982-A1 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE FUJIMI INCORPORATED (JP) 2023-10-05 US disclosed
US-20230313080-A1 SURFACE TREATMENT COMPOSITION FUJIMI INCORPORATED (JP) 2023-10-05 US disclosed
US-20230313069-A1 SURFACE TREATMENT COMPOSITION, SURFACE TREATMENT METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE FUJIMI INCORPORATED (JP) 2023-10-05 US disclosed
US-20230313070-A1 COMPOSITION FOR SURFACE TREATMENT, SURFACE TREATMENT METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE FUJIMI INCORPORATED (JP) 2023-10-05 US disclosed
EP-0712412-B1 15,15-DIALKYL-SUBSTITUTED DERIVATIVES OF ESTRADIOL SCHERING AG (DE) 1999-01-07 EP disclosed
CN-1172478-A Quinolone derivative antithrombotic agent OTSUKA PHARMA CO LTD (JP) 1998-02-04 CN disclosed
EP-0796248-A1 CARBOSTYRIL DERIVATIVES AS ANTITHROMBOTIC AGENTS OTSUKA PHARMACEUTICAL CO., LTD. (JP) 1997-09-24 EP disclosed
US-5656622-A 15,15-dialkyl-substituted derivatives of estradiol SCHERING AKTIENGESELLSCHAFT (DE) 1997-08-12 US disclosed
WO-1997012869-A1 CARBOSTYRIL DERIVATIVES AS ANTITHROMBOTIC AGENTS OTSUKA PHARMACEUTICAL COMPANY, LIMITED (JP) 1997-04-10 WO disclosed
US-5587496-A HIGH ESTROGENIC EFFECTIVENESS; CAN BE USED FOR TREATING ESTROGEN DEFICIENCY SYMPTOMS SCHERING AKTIENGESELLSCHAFT (DE) 1996-12-24 US disclosed
EP-0712412-A1 15,15-DIALKYL-SUBSTITUTED DERIVATIVES OF ESTRADIOL SCHERING AKTIENGESELLSCHAFT (DE) 1996-05-22 EP disclosed
US-5491137-A TREATING ESTROGEN DEFICIENCY SCHERING AKTIENGESELLSCHAFT (DE) 1996-02-13 US disclosed
WO-1995004070-A1 15,15-DIALKYL-SUBSTITUTED DERIVATIVES OF ESTRADIOL SCHERING AKTIENGESELLSCHAFT (DE) 1995-02-09 WO disclosed
US-4053415-A UNSATURATED POLYESTER ETHER HAVING A PHOTOCROSSLINKABLE MOIETY FUJI PHOTO FILM CO., LTD. (JA) 1977-10-11 US disclosed