⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8024305 | 0.72 | — | — | |
| SCHEMBL6645226 | 0.70 | TSHR (0.36) | — | |
| SCHEMBL1022367 | 0.69 | — | — | |
| SCHEMBL21758880 | 0.68 | — | — | |
| SCHEMBL7925744 | 0.67 | — | — | |
| SCHEMBL1472186 | 0.67 | — | — | |
| SCHEMBL24275751 | 0.65 | — | — | |
| SCHEMBL824112 | 0.65 | — | — | |
| SCHEMBL1472165 | 0.65 | — | — | |
| SCHEMBL727845 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3135711-B1 | COPOLYMERIZED POLYSILAZANE, MANUFACTURING METHOD THEREFOR, COMPOSITION COMPRISING SAME, AND METHOD FOR FORMING SILICEOUS FILM USING SAME | MERCK PATENT GMBH (DE) | 2021-07-07 | — | — | EP | disclosed |
| US-10093831-B2 | Copolymerized polysilazane, manufacturing method therefor, composition comprising same, and method for forming siliceous film using same | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2018-10-09 | — | — | US | disclosed |
| EP-3135711-A1 | COPOLYMERIZED POLYSILAZANE, MANUFACTURING METHOD THEREFOR, COMPOSITION COMPRISING SAME, AND METHOD FOR FORMING SILICEOUS FILM USING SAME | AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) | 2017-03-01 | — | — | EP | disclosed |
| US-20170044401-A1 | COPOLYMERIZED POLYSILAZANE, MANUFACTURING METHOD THEREFOR, COMPOSITION COMPRISING SAME, AND METHOD FOR FORMING SILICEOUS FILM USING SAME | AZ ELECTRONIC MATERIALS S.À R.L. (LU) | 2017-02-16 | — | — | US | disclosed |
| US-9529291-B2 | Image forming apparatus and image forming method | FUJI XEROX CO., LTD. (JP) | 2016-12-27 | — | — | US | disclosed |
| US-20160349639-A1 | IMAGE FORMING APPARATUS AND IMAGE FORMING METHOD | FUJI XEROX CO., LTD. (JP) | 2016-12-01 | — | — | US | disclosed |
| US-8178276-B2 | Method of manufacturing toner | RICOH COMPANY LIMITED (JP) | 2012-05-15 | — | — | US | disclosed |
| US-7939235-B2 | Using toner having properties preventing whiteout and other abnormalities; continuous, long term production of quality images at super high speed | RICOH COMPANY LIMITED (JP) | 2011-05-10 | — | — | US | disclosed |
| US-7935469-B2 | High temperature, high humidity performance during ultra high speed operation; toner scattering and background smear prevention | RICOH COMPANY, LTD. (JP) | 2011-05-03 | — | — | US | disclosed |
| US-20090226836-A1 | METHOD OF MANUFACTURING TONER | RICOH COMPANY LIMITED (JP) | 2009-09-10 | — | — | US | disclosed |
| US-6692882-B2 | CYLINDER SUBSTRATE OVERCOATED WITH PHOTOSENSITIVE COMPOUND; IMAGEWISE EXPOSURE; DEVELOPMENT LATENT IMAGES | KONICA CORPORATION (JP) | 2004-02-17 | — | — | US | disclosed |
| US-20030134209-A1 | Electrophotographic photoreceptor and production method of the same | KONICA CORPORATION (JP) | 2003-07-17 | — | — | US | disclosed |
| US-6569586-B2 | Comprises photosensitive layer and resin layer including organic polymer, siloxane component, and charge transfer component; durability | KONICA CORPORATION (JP) | 2003-05-27 | — | — | US | disclosed |
| US-20020110748-A1 | Cylinder substrate overcoated with photosensitive compound; imagewise exposure; development latent images | KONICA CORPORATION (JP) | 2002-08-15 | — | — | US | disclosed |
| US-20020076631-A1 | Photoreceptor for forming electrostatic latent image | KONICA CORPORATION (JP) | 2002-06-20 | — | — | US | disclosed |
| EP-1164137-A1 | Hydrosilation process using a bimetallic catalyst | DOW CORNING CORPORATION (US) | 2001-12-19 | — | — | EP | disclosed |
| US-5786495-A | HIGH MOLECULAR WEIGHT ATACTIC POLYPROPYLENE POLYMERIZATION CATALYST | MONTELL TECHNOLOGY COMPANY BV (NL) | 1998-07-28 | — | — | US | disclosed |
| EP-0506367-B1 | Novel fluorosilicone hydrides | GEN ELECTRIC (US) | 1998-06-03 | — | — | EP | disclosed |
| US-5317073-A | Fluorosilicone hydrides | GENERAL ELECTRIC COMPANY (US) | 1994-05-31 | — | — | US | disclosed |
| EP-0506367-A2 | Novel fluorosilicone hydrides | GENERAL ELECTRIC COMPANY (US) | 1992-09-30 | — | — | EP | disclosed |