⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2607871 | 0.84 | CA1 (0.31) | — | |
| SCHEMBL15697284 | 0.84 | CA1 (0.31) | — | |
| SCHEMBL18455477 | 0.82 | CA1 (0.34) | — | |
| SCHEMBL15697288 | 0.82 | — | — | |
| SCHEMBL19413962 | 0.80 | EPHX1 (0.37) | — | |
| SCHEMBL18845082 | 0.78 | EPHX1 (0.41) | — | |
| SCHEMBL18314318 | 0.77 | — | — | |
| SCHEMBL18025542 | 0.77 | — | — | |
| SCHEMBL18480033 | 0.77 | HTT (0.42) | — | |
| SCHEMBL19335790 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9790166-B2 | Polymer, monomer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-10-17 | — | — | US | disclosed |
| US-9740100-B2 | Hemiacetal compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-08-22 | — | — | US | disclosed |
| US-20170131635-A1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-05-11 | — | — | US | disclosed |