SCHEMBL18455477

SCHEMBL18455477

CC(C)(COC(=O)C(C)(C)C)NS(=O)(=O)C(F)(F)F

nearest known ligand 0.34

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.34
CA2 P00918 1/20 0.34
PRKCA P17252 1/20 0.33
MAPK1 P28482 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30
EPHX1 P07099 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15697284 0.85 CA1 (0.31) CA1CA2EPHX1
SCHEMBL2607871 0.85 CA1 (0.31) CA1CA2EPHX1
SCHEMBL18845083 0.82
SCHEMBL15697288 0.82
SCHEMBL21129428 0.81 HTT (0.33) CA1CA2
SCHEMBL775546 0.78 ALDH1A1 (0.43) CA1CA2MAPK1SMN1; SMN2
SCHEMBL20100448 0.78 CA1 (0.31) CA1CA2
SCHEMBL775729 0.78 TSHR (0.37) CA1CA2MAPK1SMN1; SMN2
SCHEMBL18025542 0.78
SCHEMBL18314318 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10005868-B2 Resist composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-06-26 US disclosed
US-20170029547-A1 RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-02-02 US disclosed